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首页> 外文期刊>Journal of the European Ceramic Society >Effects of Ta~(5+) doping on microstructure evolution, dielectric properties and electrical response in CaCu_3Ti_4O_(12) ceramics
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Effects of Ta~(5+) doping on microstructure evolution, dielectric properties and electrical response in CaCu_3Ti_4O_(12) ceramics

机译:Ta〜(5+)掺杂对CaCu_3Ti_4O_(12)陶瓷微观结构演变,介电性能和电响应的影响

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摘要

The effects of Ta~(5+) substitution on the microstructure, electrical response of grain boundary, and dielectric properties of CaCu_3Ti_4O_(12) ceramics were investigated. The mean grain size decreased with increasing Ta~(5+) concentration, which was ascribed to the ability of Ta~(5+) doping to inhibit grain boundary mobility. This can decrease dielectric constant values. Grain boundary resistance and potential barrier height of CaCu_3Ti_4O_(12) ceramics were reduced by doping with Ta~(5+). This results in enhancement of dc conductivity and the related loss tangent. Influence of charge compensations on microstructure and intrinsic electrical properties of grain boundaries resulting from the effects of replacing Ti~(4+) with Ta~(5+) are discussed. The experimental data and variation caused by the substitution of Ta~(5+) can be described well by the internal barrier layer capacitor model based on space charge polarization at the grain boundaries.
机译:研究了Ta〜(5+)取代对CaCu_3Ti_4O_(12)陶瓷微观结构,晶界电响应和介电性能的影响。随着Ta〜(5+)浓度的增加,平均晶粒尺寸减小,这归因于Ta〜(5+)掺杂抑制晶界迁移率的能力。这可以减小介电常数值。掺杂Ta〜(5+)可降低CaCu_3Ti_4O_(12)陶瓷的晶界电阻和势垒高度。这导致直流电导率和相关损耗正切的提高。讨论了用Ta〜(5+)代替Ti〜(4+)对电荷补偿对晶界微观结构和固有电性能的影响。基于Ta〜(5+)取代引起的实验数据和变化可以通过基于晶界处空间电荷极化的内部势垒层电容器模型很好地描述。

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