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Preparation of ultrathin PZT films by a chemical solution deposition method from a polymeric citrate precursor

机译:通过化学溶液沉积法从聚合物柠檬酸盐前体制备超薄PZT膜

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摘要

Ultrathin PZT film was prepared using a chemical solution deposition method from polymeric citrate precursors. The PZT solution was spin-coated on an amorphous silica layer formed on a Si(10 0) substrate. The films were thermally treated from the substrate side with a low heating rate (1 deg/ min) up to 700 deg C and finally annealed for 10 h. Ultrathin PZT films without microstructural instability were prepared in spite of high temperature and long annealing time. AFM and HRTEM investigations revealed the formation of a well-developed dense microstructure consisting of spherical crystallites (4-7 nm). Low roughness (2.2 nm) of a approx 26 nm thick layer was obtained for a two-layered PZT film. The grazing incidence X-ray diffraction (GIXRD) measurements confirmed the poly crystalline structure of ultrathin PZT films. Also, GIXRD and electron energy dispersive X-ray (EDS) analysis showed that compositional variations were smaller than expected, in spite of the long annealing time.
机译:使用化学溶液沉积法从聚合柠檬酸盐前体制备超薄PZT膜。将PZT溶液旋涂在形成在Si(10 0)衬底上的非晶硅层上。从衬底一侧以低加热速率(1 deg / min)直到700℃热处理薄膜,最后退火10 h。尽管高温和退火时间长,但仍制备了没有微观结构不稳定性的超薄PZT薄膜。原子力显微镜和高分辨透射电子显微镜研究表明,形成了由球形微晶(4-7 nm)组成的发达的致密微观结构。对于两层PZT膜,获得了约26nm厚的层的低粗糙度(2.2nm)。掠入射X射线衍射(GIXRD)测量证实了超薄PZT薄膜的多晶结构。同样,GIXRD和电子能量色散X射线(EDS)分析表明,尽管退火时间较长,但成分变化仍小于预期。

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