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Local switching behavior and electrical polarization of ferroelectric thin films under nanoindentation

机译:纳米压痕下铁电薄膜的局部开关行为和极化

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摘要

The local polarization state and switching behavior of ferroelectric thin films under external mechanical loading were investigated. A nanoindentation technique has been devised to impose local mechanical stress. The results are presented for a 700 nm thick, Pb(Zr_(0.30)Ti_(0.70))O_3 (PZT), film prepared by a sol-gel technique on a platinized Si substrate. A hysteric behavior was found in the local direct piezoelectric response of the ferroelectric thin films within the subcoercive stress range, and an enhanced piezoelectric activity is attributed to the effect of stress-induced domain-wall movement. Upon nanoindentation, voltage shift was observed in the Q-V hysteresis loops along the voltage axis, indicating an asymmetric switching behavior of the local polarization in the loaded films. The parameter of horizontal loop asymmetry increased and the Q-V loop shifted gradually to the positive voltage side as the indentation force increased. The changes in local switching behavior are suggested to result from a variation in residual stress state, asymmetric distribution of charged defects and asymmetric lattice distortion produced by the inhomogeneous indentation stress field.
机译:研究了外部机械载荷作用下铁电薄膜的局部极化态和开关行为。已经设计出一种纳米压痕技术来施加局部机械应力。给出了通过溶胶-凝胶技术在镀铂Si衬底上制备的700 nm厚Pb(Zr_(0.30)Ti_(0.70))O_3(PZT)薄膜的结果。在亚矫顽力范围内的铁电薄膜的局部直接压电响应中发现了磁滞行为,并且增强的压电活性归因于应力诱导的畴壁运动的影响。通过纳米压痕,在Q-V磁滞回线中沿电压轴观察到电压偏移,表明加载的薄膜中局部极化的不对称开关行为。随着压入力的增加,水平环路不对称性的参数增加,并且Q-V环路逐渐移向正电压侧。局部开关行为的变化被认为是由残余应力状态的变化,带电缺陷的不对称分布以及不均匀的压应力场产生的不对称晶格畸变引起的。

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