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首页> 外文期刊>Journal of Semiconductors >Continuous surface potential versus voltage equation of intrinsic surrounding-gateMOSFETs and analytic solution from accumulation to strong inversion region~*
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Continuous surface potential versus voltage equation of intrinsic surrounding-gateMOSFETs and analytic solution from accumulation to strong inversion region~*

机译:本征周围栅MOSFET的连续表面电势与电压方程以及从累积到强反转区域的解析解〜*

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摘要

A continuous surface potential versus voltage equation is proposed and then its solution is further discussed for a long channel intrinsic surrounding-gate (SRO) MOSFET from the accumulation to strong inversion region. The original equation is derived from the exact solution of a simplified Poisson equation and then the empirical correction is performed from the mathematical condition required by the continuity of the solution, which results in a continuous surface potential versus voltage equation, allowing the surface potential and the related derivatives to be described by an analytic solution from the accumulation to strong inversion region and from linear to the saturation region accurately and continuously. From these results, the dependences of surface potential and centric potential characteristics on device geometry are analyzed and the results are also verified with the 3-D numerical simulation from the aspect of accuracy and continuity tests.
机译:提出了一个连续的表面电势对电压方程,然后进一步讨论了从累积到强反转区域的长沟道本征环绕栅(SRO)MOSFET的解决方案。原始方程式是从简化的Poisson方程的精确解导出的,然后根据解的连续性所需的数学条件进行经验校正,这导致了连续的表面电势与电压方程,从而允许表面电势和可以通过解析解决方案准确,连续地描述从累积到强反演区域以及从线性到饱和区域的相关导数。根据这些结果,分析了表面电势和中心电势特性对器件几何形状的依赖性,并从精度和连续性测试的角度通过3-D数值模拟验证了结果。

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