首页> 外文期刊>Journal of Semiconductors >On-current modeling of short-channel double-gate (DG) MOSFETs with a vertical Gaussian-like doping profile
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On-current modeling of short-channel double-gate (DG) MOSFETs with a vertical Gaussian-like doping profile

机译:具有垂直高斯型掺杂分布的短沟道双栅(DG)MOSFET的电流模型

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摘要

An analytic drain current model is presented for doped short-channel double-gate MOSFETs with a Gaussian-like doping profile in the vertical direction of the channel. The present model is valid in linear and saturation regions of device operation. The drain current variation with various device parameters has been demonstrated. The model is made more physical by incorporating the channel length modulation effect. Parameters like transconductance and drain conductance that are important in assessing the analog performance of the device have also been formulated. The model results are validated by numerical simulation results obtained by using the commercially available ATLAS?, a two dimensional device simulator from SILVACO.
机译:提出了一种分析型漏极电流模型,用于在沟道垂直方向具有高斯型掺杂轮廓的掺杂短沟道双栅MOSFET。本模型在器件工作的线性和饱和区域有效。已经证明了漏极电流随各种器件参数的变化。通过合并通道长度调制效果,可以使模型更具物理性。诸如跨导和漏极电导的参数对于评估器件的模拟性能也很重要。通过使用市售的SILVACO二维设备模拟器ATLAS?获得的数值模拟结果验证了模型结果。

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