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C-V method to extract lateral channel doping profiles of MOSFETs
C-V method to extract lateral channel doping profiles of MOSFETs
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机译:C-V方法提取MOSFET的横向沟道掺杂分布
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摘要
A method and apparatus that uses gate-to-substrate capacitance with varying amounts of source/drain junction bias to measure channel lateral doping profile by applying a series of different voltages between the source/drain and the substrate. The gate capacitance is measured for the different voltages. The capacitance is used to calculate the depletion width. From the depletion width, channel doping is calculated. Using this method direct evidence of a localized Boron pile up at source/drain edge is shown.
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