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首页> 外文期刊>Journal of Semiconductors >Evaluation of the drain–source voltage effect on AlGaAs/InGaAs PHEMTs thermal resistance by the structure function method
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Evaluation of the drain–source voltage effect on AlGaAs/InGaAs PHEMTs thermal resistance by the structure function method

机译:用结构函数法评估漏源电压对AlGaAs / InGaAs PHEMTs热阻的影响

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摘要

The effect of drain–source voltage on AlGaAs/InGaAs PHEMTs thermal resistance is studied by experimental measuring and simulation. The result shows that AlGaAs/InGaAs PHEMTs thermal resistance presents a downward trend under the same power dissipation when the drain–source voltage (V_(DS)) is decreased. Moreover, the relatively low V_(DS) and large drain–source current (I_(DS)) result in a lower thermal resistance. The chip-level and package-level thermal resistance have been extracted by the structure function method. The simulation result indicated that the high electric field occurs at the gate contact where the temperature rise occurs. A relatively low V_(DS) leads to a relatively low electric field, which leads to the decline of the thermal resistance.
机译:通过实验测量和仿真研究了漏源电压对AlGaAs / InGaAs PHEMTs热阻的影响。结果表明,当漏极-源极电压(V_(DS))降低时,在相同功耗下,AlGaAs / InGaAs PHEMTs热阻呈现下降趋势。此外,相对较低的V_(DS)和较大的漏-源电流(I_(DS))导致较低的热阻。通过结构函数法提取了芯片级和封装级的热阻。仿真结果表明,高电场发生在温度升高的栅极触点处。相对较低的V_(DS)导致相对较低的电场,这导致热阻下降。

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