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首页> 外文期刊>Journal of Semiconductors >Heterojunction DDR THz IMPATT diodes based on Al_xGa_(1-x)N/GaN material system
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Heterojunction DDR THz IMPATT diodes based on Al_xGa_(1-x)N/GaN material system

机译:基于Al_xGa_(1-x)N / GaN材料系统的异质结DDR THz IMPATT二极管

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摘要

Simulation studies are made on the large-signal RF performance and avalanche noise properties of heterojunction double-drift region (DDR) impact avalanche transit time (IMPATT) diodes based on Al_xGa_(1-x)N/GaN material system designed to operate at 1.0 THz frequency. Two different heterojunction DDR structures such as n-Al_(0.4)Ga_(0.6)N/p-GaN and n-GaN/p-Al_(0.4)Ga_(0.6)N are proposed in this study. The large-signal output power, conversion efficiency and noise properties of the heterojunction DDR IMPATTs are compared with homojunction DDR IMPATT devices based on GaN and Al_(0.4)Ga_(0.6)N. The results show that the n-Al_(0.4)Ga_(0.6)N/p-GaN heterojunction DDR device not only surpasses the n-GaN/p-Al_(0.4)Ga_(0.6)N DDR device but also homojunction DDR IMPATTs based on GaN and Al_(0.4)Ga_(0.6)N as regards large-signal conversion efficiency, power output and avalanche noise performance at 1.0 THz.
机译:基于设计为工作在1.0的Al_xGa_(1-x)N / GaN材料系统对异质结双漂移区(DDR)冲击雪崩渡越时间(IMPATT)二极管的大信号RF性能和雪崩噪声特性进行了仿真研究太赫兹频率。本研究提出了两种不同的异质结DDR结构,例如n-Al_(0.4)Ga_(0.6)N / p-GaN和n-GaN / p-Al_(0.4)Ga_(0.6)N。将异质结DDR IMPATT的大信号输出功率,转换效率和噪声特性与基于GaN和Al_(0.4)Ga_(0.6)N的同质结DDR IMPATT器件进行了比较。结果表明,n-Al_(0.4)Ga_(0.6)N / p-GaN异质结DDR器件不仅超越了n-GaN / p-Al_(0.4)Ga_(0.6)N DDR器件,而且超过了基于同质结DDR IMPATTs的器件GaN和Al_(0.4)Ga_(0.6)N在1.0 THz时的大信号转换效率,功率输出和雪崩噪声性能方面的优势。

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