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首页> 外文期刊>Journal of Semiconductors >A Ku-band 3.4 W/mm power AlGaN/GaN HEMT on a sapphire substrate
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A Ku-band 3.4 W/mm power AlGaN/GaN HEMT on a sapphire substrate

机译:蓝宝石衬底上的Ku波段3.4 W / mm功率AlGaN / GaN HEMT

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摘要

This paper describes the first domestic Ku-band power AlGaN/GaN HEMT fabricated on a sapphire substrate. The device with a gate width of 0.5 mm and a gate length of 0.35 μm has exhibited an extrinsic current gain cutoff frequency of 20 GHz and an extrinsic maximum frequency of oscillation of 75 GHz. Under V_(DS) = 30 V, CW operating conditions at 14 GHz, the device exhibits a linear gain of 10.4 dB and a 3-dB-gain-compressed output power of 1.4 W with a power added efficiency of 41%. Under pulse operating conditions, the linear gain is 12.8 dB and the 3-dB-compressed output power is 1.7 W. The power density reaches 3.4 W/mm.
机译:本文介绍了在蓝宝石衬底上制造的第一款家用Ku波段功率AlGaN / GaN HEMT。栅极宽度为0.5 mm,栅极长度为0.35μm的器件的外部电流增益截止频率为20 GHz,外部最大振荡频率为75 GHz。在14 GHz的CW工作条件下,V_(DS)= 30 V时,该器件具有10.4 dB的线性增益和1.4 W的3dB增益压缩输出功率,功率附加效率为41%。在脉冲工作条件下,线性增益为12.8 dB,3 dB压缩后的输出功率为1.7W。功率密度达到3.4 W / mm。

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