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首页> 外文期刊>Journal of Solid State Chemistry >Investigation of the silicon concentration effect on Si-doped anatase TiO_2 by first-principles calculation
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Investigation of the silicon concentration effect on Si-doped anatase TiO_2 by first-principles calculation

机译:用第一性原理研究硅浓度对掺硅锐钛矿型TiO_2的影响

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摘要

A first-principles calculation based on the density functional theory (DFT) was used to investigate the energetic and electronic properties of Si-doped anatase TiO_2 with various silicon concentrations. The theoretical calculations showed that with Si-doping the valence band and conduction band of TiO_2 became hybrid ones with large dispersion, which could benefit the mobility of the photo-generated carriers. This result is in agreement with the experimental reports. At lower doping levels, the band gap of Si-doped anatase TiO_2 decreases about 0.2 eV. With the increase of silicon concentration, the band gap increases gradually and larger formation energies are required during the synthesis of Si-doped TiO_2.
机译:基于密度泛函理论(DFT)的第一性原理计算用于研究不同硅浓度的掺硅锐钛矿型TiO_2的能量和电子性质。理论计算表明,掺Si后,TiO_2的价带和导带成为具有较大色散的杂化带,有利于光生载流子的迁移。该结果与实验报告一致。在较低的掺杂水平下,Si掺杂的锐钛矿型TiO_2的带隙减小约0.2 eV。随着硅浓度的增加,禁带宽度逐渐增大,并且在掺硅的TiO_2合成过程中需要更大的形成能。

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