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首页> 外文期刊>Journal of Sol-Gel Science and Technology >Effects of Ba(Mg1/3Ta2/3)O-3 buffer layer on the fatigue behavior in Pb(Zr0.52Ti0.48)O-3 thin films
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Effects of Ba(Mg1/3Ta2/3)O-3 buffer layer on the fatigue behavior in Pb(Zr0.52Ti0.48)O-3 thin films

机译:Ba(Mg1 / 3Ta2 / 3)O-3缓冲层对Pb(Zr0.52Ti0.48)O-3薄膜疲劳行为的影响

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In this paper, Pb(Zr0.52Ti0.48)O-3 (PZT) thin films were deposited on Pt/Ti/SiO2/Si substrates via sol-gel method by using Ba(Mg1/3Ta2/3)O-3 (BMT) thin film as buffer layer. The effects of BMT buffer layer on the fatigue behavior in PZT thin films were investigated. After 1.04 x 10(8) reversal cycles, the remnant polarization value of buffered PZT thin films decreases only 12.1 %, while it decreases 58.2 % in PZT thin films. The results reveal that BMT buffer layer can greatly improve the fatigue properties of PZT thin films, which are related to the oxygen vacancies accumulation. The oxygen vacancies accumulation can reduce the electric field across the PZT layer and inhibit the motion of domain. BMT buffer layer can modify the PZT/Pt interface, which can reduce mobility of oxygen vacancies from PZT thin films to PZT/Pt interface. Moreover, the energy bandgap of PZT films (E-g = 3.6 eV) is similar to that of BMT films (E-g = 3.7 eV), which can minimize the oxygen vacancies accumulation. Furthermore, BMT buffer layer can reduce the residual stress, which can reduce suppression of domain switching.
机译:本文利用Ba(Mg1 / 3Ta2 / 3)O-3(Pt / Ti / SiO2 / Si)溶胶-凝胶法在Pt / Ti / SiO2 / Si衬底上沉积了Pb(Zr0.52Ti0.48)O-3(PZT)薄膜。 BMT)薄膜作为缓冲层。研究了BMT缓冲层对PZT薄膜疲劳行为的影响。在1.04 x 10(8)反转周期后,缓冲的PZT薄膜的剩余极化值仅降低12.1%,而在PZT薄膜中则降低58.2%。结果表明,BMT缓冲层可以大大改善PZT薄膜的疲劳性能,这与氧空位的积累有关。氧空位的积累可以减少PZT层上的电场并抑制畴的运动。 BMT缓冲层可以修改PZT / Pt界面,从而可以减少氧空位从PZT薄膜到PZT / Pt界面的迁移率。此外,PZT薄膜的能带隙(E-g = 3.6 eV)与BMT薄膜的能带隙(E-g = 3.7 eV)相似,可将氧空位积累最小化。此外,BMT缓冲层可以减小残余应力,这可以减小对域切换的抑制。

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