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首页> 外文期刊>Materials Research Bulletin >Ferroelectric and piezoelectric responses of (110) and (001)-oriented epitaxial Pb(Zr0.52Ti0.48)O-3 thin films on all-oxide layers buffered silicon
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Ferroelectric and piezoelectric responses of (110) and (001)-oriented epitaxial Pb(Zr0.52Ti0.48)O-3 thin films on all-oxide layers buffered silicon

机译:全氧化物层上(110)和(001)取向外延Pb(Zr0.52Ti0.48)O-3薄膜的铁电和压电响应缓冲硅

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摘要

Epitaxial ferroelectric Pb(Zro(0.52)Ti(0.48))O-3 (PZT) thin films were fabricated on silicon substrates using pulsed laser deposition. Depending on the buffer layers and perovskite oxide electrodes, epitaxial films with different orientations were grown. (110)-oriented PZT/SrRuO3 (and PZT/LaNiO3) films were obtained on YSZ-buffered Si substrates, while (001)-oriented PZT/SrRuO3 (and PZT/LaNiO3) were fabricated with an extra CeO2 buffer layer (CeO2/YSZ/Si). There is no effect of the electrode material on the properties of the films. The initial remnant polarizations in the (001)-oriented films are higher than those of (110)-oriented films, but it increases to the value of the (001) films upon cycling. The longitudinal piezoelectric d33,(f) coefficients of the (110) films are larger than those of the (001) films, whereas the transverse piezoelectric d31,(f) coefficients in the (110)-films are less than those in the (001)-oriented films. The difference is ascribed to the lower density (connectivity between grains) of the former films. (C) 2015 Elsevier Ltd. All rights reserved.
机译:外延铁电Pb(Zro(0.52)Ti(0.48))O-3(PZT)薄膜是利用脉冲激光沉积法在硅基板上制备的。根据缓冲层和钙钛矿氧化物电极,生长具有不同取向的外延膜。在YSZ缓冲的Si衬底上获得(110)取向的PZT / SrRuO3(和PZT / LaNiO3)膜,而(001)取向的PZT / SrRuO3(和PZT / LaNiO3)用额外的CeO2缓冲层(CeO2 / YSZ / Si)。电极材料对薄膜的性能没有影响。 (001)取向膜中的初始残余极化高于(110)取向膜中的初始残余极化,但是在循环时它增加到(001)膜的值。 (110)膜的纵向压电d33,(f)系数大于(001)膜,而(110)膜的横向压电d31,(f)系数小于(110)膜001)导向的电影。差异归因于先前的膜的较低密度(晶粒之间的连接性)。 (C)2015 Elsevier Ltd.保留所有权利。

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