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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Electrical and photoelectrical properties of Ag-In-Se thin films evaporated by e-beam technique
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Electrical and photoelectrical properties of Ag-In-Se thin films evaporated by e-beam technique

机译:电子束技术蒸发的Ag-In-Se薄膜的电和光电性能

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In this study, the electrical and photoelectrical properties of the Ag-In-Se thin films deposited by the e-beam technique have been investigated by carrying out temperature dependent conductivity, photoconductivity under different illumination intensities and photoresponse measurements between 380 and 1050 nm, as a function of annealing temperature. The measured conductivity values of the films at room temperature depending on the annealing temperatures vary in the range 1.9 x 10(-6)-5.2 Omega(-1) cm(-1). Annealing the films above 200 degrees C results in degenerate thin films. Photoconductivity of the films increases with illumination intensity and its value reaches about 300 times dark conductivity values as the illumination intensity is increased from 17 to 113mW cm(-2) for as-grown samples. The relation between photocurrent and excitation intensity is of I-ph x phi(n)-type. n values varying in the range of 0.96 and 1.55 imply the supralinear photoconductivity with the two-centre model. The spectral distribution of photoconductivity shows three maxima located at 1.57, 1.77 and 2.01 eV, which was governed by the splitting of p-like levels in the valence band including the effects of a tetragonal crystalline field (Delta(CF)) and spin-orbit (Delta(SO)) interaction. The band gap energies of as-grown and the 200 degrees C annealed films are determined to be 1.57 eV and 1.68 eV, respectively.
机译:在这项研究中,通过进行温度依赖性的电导率,在不同照射强度下的光导率以及在380 nm和1050 nm之间的光响应测量,研究了通过电子束技术沉积的Ag-In-Se薄膜的电学和光电性能。退火温度的函数。取决于退火温度,室温下薄膜的电导率测量值在1.9 x 10(-6)-5.2 Omega(-1)cm(-1)范围内变化。在高于200摄氏度的温度下对薄膜进行退火会导致薄膜退化。薄膜的光电导率随照明强度的增加而增加,其值达到约300倍暗电导率值,这是因为随着样品的增加,照明强度从17mW cm(-2)增加。光电流与激发强度之间的关系为I-ph x phi(n)型。 n值在0.96和1.55的范围内变化,表示两中心模型具有超线性光电导性。光电导的光谱分布显示三个最大值分别位于1.57、1.77和2.01 eV,这受价带中p型能级的分裂控制,包括四方晶场(Delta(CF))和自旋轨道的影响(Delta(SO))互动。确定生长的薄膜和200摄氏度退火的薄膜的带隙能量分别为1.57 eV和1.68 eV。

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