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首页> 外文期刊>Journal of Photopolymer Science and Technology >Synthesis and Characterization of Polycarbonate-containing All-organic High-chi Block Copolymers for Directed Self-assembly
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Synthesis and Characterization of Polycarbonate-containing All-organic High-chi Block Copolymers for Directed Self-assembly

机译:含聚碳酸酯的全有机高智嵌段共聚物的定向合成及其表征

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摘要

To extend the scaling beyond the most widely used block copolymer (BCP), poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA), a new organic high-chi BCP based was developed. Polystyrene-b-polytrimethylene carbonate (PS-b-PTMC) BCP was synthesized using ring opening polymerization (ROP) of trimethylene carbonate from hydroxy-functional polystyrene (PS-OH) with diazabicyclo[5.4.0]undec-7-ene (DBU) as the base catalyst. The resulting BCP was characterized by H-1 nuclear magnetic resonance (NMR) and gel permeation chromatography (GPC) to confirm the complete chain extension of the polystyrene macroinitiator. For the DBU catalyzed BCP, the GPC trace revealed a trimodal distribution indicating the presence of coupling product and homo-PTMC impurity. Using purification techniques, homo-PTMC impurity was isolated to afford purified BCP. Thin-film morphologies of the non-purified and the purified BCPs on poly(methyl methacrylate) (PMMA) coated substrates followed by short thermal annealing were characterized using atomic force microscopy (AFM) analysis. The non-purified BCP showed island morphology with a step-height of 17 nm whereas the purified PS-b-PTMC showed a flat film with parallel cylinders of 16.4 nm pitch row-to-row distance. The ability for the PS-b-PTMC to self-assemble below 20-nm pitch resolution confirms the high interaction parameter, chi, between the PS and PTMC blocks and is a promising candidate as a high-chi BCP for directed self-assembly (DSA) application.
机译:为了将缩放比例扩展到最广泛使用的嵌段共聚物(BCP),聚(苯乙烯)-嵌段-聚(甲基丙烯酸甲酯)(PS-b-PMMA)之外,开发了一种新型的有机高辛BCP。聚苯乙烯-b-聚碳酸三亚甲基酯(PS-b-PTMC)使用碳酸三亚甲基酯的开环聚合(ROP),由羟基官能团的聚苯乙烯(PS-OH)与二氮杂双环[5.4.0]十一碳-7-烯(DBU)合成BCP )作为基础催化剂。通过H-1核磁共振(NMR)和凝胶渗透色谱(GPC)对所得BCP进行表征,以确认聚苯乙烯大分子引发剂的完整扩链。对于DBU催化的BCP,GPC迹线显示三峰分布,表明存在偶联产物和均一PTMC杂质。使用纯化技术,分离均一PTMC杂质以提供纯化的BCP。使用原子力显微镜(AFM)分析来表征未纯化的BCP和纯化的BCP在聚甲基丙烯酸甲酯(PMMA)涂覆的基材上的薄膜形态,然后进行短暂的热退火。未纯化的BCP表现出岛状形态,步长为17 nm,而纯化的PS-b-PTMC显示出具有平行圆柱体的平膜,行距为16.4 nm。 PS-b-PTMC能够以低于20 nm的间距分辨率进行自组装,这证实了PS和PTMC块之间的高相互作用参数chi,并且有望成为定向自组装的高chi BCP( DSA)应用程序。

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