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Conference on alternative lithographic technologies VII

召开年：2016
召开地：San Jose, CA(US)
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1.Design for nanoimprint lithography: Total layout refinement utilizing NIL process simulation

机译：纳米压印光刻的设计：利用NIL工艺仿真进行总体布局优化
- 作者：Sachiko Kobayashi;Motofumi Komori;Inanami Ryoichi;Kyoji Yamashita;Akiko Mimotogi;Ji-Young Im;Masayuki Hatano;Takuya Kono;Shimon Maeda
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- nanoimprint lithography;
- resist fluid;
- alignment;
- shear stress;
- design for imprint;
2.Investigation of Coat-Develop Track System for Placement Error of Contact Hole Shrink Process

机译：接触孔收缩过程放置误差的涂层显影跟踪系统研究
- 作者：Masahiko Harumoto;Harold Stokes;Yuji Tanaka;Koji Kaneyama;Charles Pieczulewski;Masaya Asai;Isabelle Servin;Maxime Argoud;Ahmed Gharbi;Celine Lapeyre;Raluca Tiron;Cedric Monget
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- directed self-assembly (DSA);
- placement error;
- coat develop track;
- resist process;
- contact-hole shrink;
3.Modeling and Parameter Tuning for Templated Directed Self-Assembly

机译：模板定向自组装的建模和参数优化
- 作者：B. Meliorisz;T. Muelders;H.-J. Stock;S. Marokkey;W. Demmerle;K. Lai;A. Raghunathan;P. Dhagat
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- directed self-assembly (DSA);
- modeling;
- simulation;
- optimization;
- DSA defectivity;
4.Dots-on-the-fly electron beam lithography

机译：飞行点电子束光刻
- 作者：Tero J. Isotalo;Tapio Niemi
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- periodic nano-structures;
- electron beam lithography;
- nano-particle arrays;
- nano-fabrication;
- optoelectronics;
- plasmonics;
5.Nano-imprint lithography using Poly (Methyl Methacrylate) (PMMA) and Polystyrene (PS) polymers

机译：使用聚甲基丙烯酸甲酯（PMMA）和聚苯乙烯（PS）聚合物的纳米压印光刻
- 作者：Yung-Chiang Ting;Shyi-Long Shy
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- PMMA polymer;
- PS polymer;
- Thermal nano-imprint lithography;
6.Nanoscale patterning in ambient conditions using liquid electromigration

机译：使用液体电迁移在环境条件下进行纳米图案化
- 作者：Santanu Talukder;Praveen Kumar;Rudra Pratap
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Electromigration;
- lithography;
- vector scan;
- large area patterning;
7.Control of morphological defects at the boundary between the periodic and non-periodic patterns in directed self-assembly process

机译：定向自组装过程中周期性和非周期性模式边界处的形态缺陷控制
- 作者：Akihisa Yoshida;Kenji Yoshimoto;Masahiro Ohshima;Katsuyoshi Kodera;Yoshihiro Naka;Hideki Kanai;Sachiko Kobayashi;Simon Maeda;Phubes Jiravanichsakul;Katsutoshi Kobayashi;Hisako Aoyama
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- directed self-assembly;
- diblock copolymer;
- PS-b-PMMA;
- lamella;
- non-periodic;
- simulation;
8.Directed self-assembly of Si-containing and topcoat free block copolymer

机译：含硅无面漆嵌段共聚物的定向自组装
- 作者：Tasuku Matsumiya;Takehiro Seshimo;Tsuyoshi Kurosawa;Hitoshi Yamano;Ken Miyagi;Tomotaka Yamada;Katsumi Ohmori
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Directed self-assembly (DSA);
- Block copolymer (BCP);
- High chi BCP;
- Si-containing;
- Topcoat free;
- Graphoepitaxy;
- Perpendicular lamella;
9.Nanoimprint System Development and Status for High Volume Semiconductor Manufacturing

机译：纳米压印系统的开发和大批量半导体制造的现状
- 作者：Tsuneo Takashima;Yukio Takabayashi;Naosuke Nishimura;Keiji Emoto;Takahiro Matsumoto;Tatsuya Hayashi;Atsushi Kimura;Jin Choi;Phil Schumaker
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Jet and Flash Imprint Lithography;
- J-FIL;
- nanoimprint lithography;
- NIL;
- overlay;
- throughput;
- defectivity;
- particles;
- mask life;
10.Defectivity and Particle Reduction For Mask Life Extension, and Imprint Mask Replication For High Volume Semiconductor Manufacturing

机译：降低缺陷率和减少颗粒，以延长掩模寿命，并复制压印掩模，以实现大批量半导体制造
- 作者：Keiji Emoto;Fumio Sakai;Chiaki Sato;Yukio Takabayashi;Hitoshi Nakano;Tsuneo Takashima;Kiyohito Yamamoto;Tadashi Hattori;Mitsuru Hiura;Toshiaki Ando;Yoshio Kawanobe;Hisanobu Azuma;Takehiko Iwanaga;Jin Choi;Ali Aghili;Chris Jones;J.W.Irving;Brian Fletcher;Zhengmao Ye
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Jet and Flash Imprint Lithography;
- J-FIL;
- nanoimprint lithography;
- NIL;
- defectivity;
- particles;
- mask life;
11.Pattern Fidelity Improvement of Chemo-Epitaxy DSA Process for High Volume Manufacturing

机译：用于大批量生产的化学外延DSA工艺的图案逼真度改进
- 作者：Makoto Muramatsu;Takanori Nishi;Gen You;Yusuke Saito;Yasuyuki Ido;Kiyohito Ito;Toshikatsu Tobana;Masanori Hosoya;Weichien Chen;Satoru Nakamura;Mark Somervell;Takahiro Kitano
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- directed self-assembly;
- chemo-epitaxy;
- defect;
- LER/LWR;
12.DSA Via Hole Shrink for Advanced Node Applications

机译：用于高级节点应用的DSA通孔收缩
- 作者：Cheng Chi;Chi-Chun Liu;Luciana Meli;Kristin Schmidt;Yongan Xu;Anuja DeSilva;Martha Sanchez;Richard Farrell;Hongyun Cottle;Daiji Kawamura;Lovejeet Singh;Tsuyoshi Furukawa;Kafai Lai;Jed W. Pitera;Daniel Sanders;David Hetzer;Andrew Metz;Nelson Felix;John Arnold;Matthew Colburn
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- DSA;
- Lamellae forming-BCP;
- contact hole;
- Directed Self-assembly;
13.Manufacturability of dense hole arrays with directed self-assembly using the CHIPS flow

机译：使用CHIPS流进行定向自组装的密集孔阵列的可制造性
- 作者：Arjun Singh;Jaewoo Nam;Jongsu Lee;Boon Teik Chan;Hengpeng Wu;Jian Yin;Yi Cao;Roel Gronheid
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- DSA;
- frequency multiplication;
- contact holes;
- chemo-epitaxy;
- hexagonal array;
- cylindrical phase;
- LCDU;
- placement accuracy;
14.Process highlights to enhance DSA contact patterning performances

机译：工艺亮点可增强DSA接触图案性能
- 作者：A. Gharbi;R. Tiron;M. Argoud;G. Chamiot-Maitral;A. Fouquet;C. Lapeyre;P. Pimento Barros;A. Sarrazin;I. Servin;F. Delachat;S. Bos;S. Berard-Bergery;J. Hazart;X. Chevalier;C. Nicolet;C. Navarro;I. Cayrefourcq;S. Bouanani;C. Monget
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- block copolymer;
- self-assembly;
- contact shrink;
- contact multiplication;
- planarization;
15.Development of a MEMS electrostatic condenser lens array for nc-Si surface electron emitters of the Massive Parallel Electron Beam Direct-Write system

机译：大规模平行电子束直接写入系统的nc-Si表面电子发射器的MEMS静电电容透镜阵列的开发
- 作者：A. Kojima;N. Ikegami;T. Yoshida;H. Miyaguchi;M. Muroyama;S. Yoshida;K. Totsu;N. Koshida;M. Esashi
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- massive parallel;
- MEMS;
- nanocrystalline silicon;
- condenser lens array;
- electron beam lithography;
16.Non-CAR resists and advanced materials for massively parallel e-beam direct write process integration

机译：非CAR抗蚀剂和先进材料，用于大规模并行电子束直接写入过程集成
- 作者：Marie-Line Pourteau;Isabelle Servin;Kevin Lepinay;Cyrille Essomba;Bernard DalZotto;Jonathan Pradelles;Ludovic Lattard;Pieter Brandt;Marco Wieland
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- advanced e-beam resists;
- low-energy e-beam lithography;
- massively parallel mask-less electron beam lithography;
- non-CAR;
- CDL;
- charging;
- LWR;
- top-coat;
- etch transfer;
17.Prediction of positioning error in EB lithography

机译：EB光刻中的定位误差预测
- 作者：Masaki Kimura;Kazuo Goda
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- EB lithography;
- photomask;
- position error;
- charging effect;
- charge-up;
- resist;
- simulation;
- electric dipole;
18.Improvement of sub-20nm pattern quality with dose modulation technique for NIL template production

机译：使用剂量调制技术改善NIL模板生产的20nm以下图形质量
- 作者：Keisuke Yagawa;Kunihiro Ugajin;Machiko Suenaga;Shingo Kanamitsu;Takeharu Motokawa;Kazuki Hagihara;Yukiyasu Arisawa;Sachiko Kobayashi;Masato Saito;Masamitsu Ito
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
19.New placement estimator for contact hole printed with DSA

机译：DSA印刷的接触孔的新位置估算器
- 作者：L. Schneider;V. Farys;E. Serret;C. Fenouillet-Beranger
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- DSA;
- Placement estimator;
- Otha-Kawasaki;
20.Strategies to enable Directed Self-Assembly Contact Hole Shrink for Tight Pitches

机译：为紧密间距实现定向自组装接触孔收缩的策略
- 作者：Kristin Schmidt;Hitoshi Osaki;Kota Nishino;Martha Sanchez;Chi-Chun Liu;Tsuyoshi Furukawa;Cheng Chi;Jed Pitera;Nelson Felix;Daniel Sanders
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Directed Self-Assembly;
- Block Copolymer;
- Contact Hole Shrink;
- High chi;
21.A route to industry compatible directed self-assembly of high-chi PS-PDMS block copolymers

机译：高相容性PS-PDMS嵌段共聚物走向行业兼容的定向自组装的途径
- 作者：S. Boehme;C. Girardot;J. Garnier;J. Arias-Zapata;S. Arnaud;R. Tiron;O. Marconot;D. Buttard;M. Zelsmann
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
22.Defectivity prediction for droplet-dispensed UV nanoimprint lithography, enabled by fast simulation of resin flow at feature, droplet, and template scales

机译：通过在特征，液滴和模板比例下快速模拟树脂流动，可以预测液滴分布的UV纳米压印光刻的缺陷率
- 作者：Hayden K. Taylor
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Nanoimprint lithography;
- multi-scale;
- computational lithography;
- simulation;
- design for manufacture;
23.Directed Self Assembly (DSA) Compliant Flow with Immersion Lithography - From Material to Design and Patterning

机译：具有浸没式光刻的直接自组装（DSA）兼容流程-从材料到设计和图案制作
- 作者：Yuansheng Ma;Yan Wang;James Word;Junjiang Lei;Joydeep Mitra;J. Andres Torres;Le Hong;Germain Fenger;Daman Khaira;Moshe Preil;Lei Yuan;Jongwook Kye;Harry J. Levinson
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
24.Shape Optimization for DSA

机译：DSA的形状优化
- 作者：Gaddiel Ouaknin;Nabil Laachi;Kris Delaney;Glenn Fredrickson;Frederic Gibou
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- DSA;
- level-set;
- shape optimization;
- SCFT;
- inverse problem;
25.Exploring the potential of Multiphoton Laser Ablation Lithography (MP-LAL) as a reliable technique for sub50 nm patterning

机译：探索多光子激光烧蚀光刻技术（MP-LAL）作为低于50 nm图案化的可靠技术的潜力
- 作者：Theodoros Manouras;Evangelos Angelakos;Maria Vamvakaki;Panagiotis Argitis
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
26.Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography

机译：电子束光刻中静电微柱的设计与制造
- 作者：Zhidong Du;Ye Wen;Luis Traverso;Anurup Datta;Chen Chen;Xianfan Xu;Liang Pan
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- electron-beam lithography;
- multiple beam direct write;
- electron optics;
- microcolumn;
- maskless lithography;
27.Experiments towards Establishing of Design Rules for R2R-UV-NIL with Polymer Working Shims

机译：建立带有聚合物工作垫片的R2R-UV-NIL设计规则的实验
- 作者：Dieter Nees;Stephan Ruttloff;Ursula Palfinger;Barbara Stadlober
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
28.DSA patterning options for FinFET formation at 7nm node

机译：用于在7nm节点上形成FinFET的DSA图案选择
- 作者：Chi-Chun (Charlie) Liu;Elliott Franke;Fee Li Lie;Stuart Sieg;Hsinyu Tsai;Kafai Lai;Hoa Truong;Richard Farrell;Mark Somervell;Daniel Sanders;Nelson Felix;Michael Guillorn;Sean Burns;David Hetzer;Akiteru Ko;John Arnold;Matthew Colburn
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Directed self-assembly;
- DSA;
- block copolymer;
- BCP;
- Chemoepitaxy;
- Graphoepitaxy;
- FinFET;
- customization;
29.Virtual fabrication using Directed Self-Assembly for process optimization in a 14nm DRAM

机译：使用定向自组装进行虚拟制造以优化14nm DRAM中的工艺
- 作者：Mattan Kamon;Mustafa Akbulut;Yiguang Yan;Daniel Faken;Andras Pap;Vasanth Allampalli;Ken Greiner;David Fried
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Directed Self-Assembly;
- DSA;
- Virtual Fabrication;
- Process Integration;
- DRAM;
- Chemoepitaxy;
- yield optimization;
30.Complete Data Preparation Flow for Massively Parallel E-beam Lithography on 28nm Node Full Field Design

机译：28nm节点全场设计上大规模并行电子束光刻的完整数据准备流程
- 作者：Aurelien Fay;Clyde Browning;Pieter Brandt;Jacky Chartoire;Sebastien Berard-Bergery;Jerome Hazart;Alexandre Chagoya;Sergei Postnikov;Mohamed Saib;Ludovic Lattard;Patrick Schiavone
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Massively Parallel Mask-less E-beam lithography;
- Data Preparation;
- Cycle Time;
- Proximity Effect Correction;
- Verification;
- 28nm Metal1;
- Simulation;
31.A Paradigm Shift in Patterning Foundation from Frequency Multiplication to Edge-Placement Accuracy: A Novel Processing Solution by Selective Etching and Alternating-Material Self-Aligned Multiple Patterning

机译：图案基础从频率乘法到边缘放置精度的范式转变：通过选择性蚀刻和交替材料自对准多重图案的新型处理解决方案
- 作者：Ting Han;Hongyi Liu;Yijian Chen
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
32.Requirements of the e-beam shot quality for mask patterning of the sub-1X device

机译：Sub-1X设备的掩模图案对电子束发射质量的要求
- 作者：Sinjeung Park;Jongmun Park;Boram Lee;Jin Choi;In Kyun Shin;Chan-Uk Jeon
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Photomask;
- Pattern complexity;
- Variable Shaped Beam;
- E-beam writer;
- Shot quality;
- Data fracturing;
33.High Throughput Jet and Flash Imprint Lithography for semiconductor memory applications

机译：适用于半导体存储应用的高通量喷射和闪存压印光刻
- 作者：Wei Zhang;Brian Fletcher;Ecron Thompson;Weijun Liu;Tim Stachowiak;Niyaz Khusnatdinov;J. W. Irving;Whitney Longsine;Matthew Traub;Van Truskett;Dwayne LaBrake;Zhengmao Ye
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Jet and Flash Imprint Lithography;
- J-FIL;
- nanoimprint lithography;
- NIL throughput;
- non-fill defects;
34.Sub-15nm Patterning Technology using Directed Self-Assembly on Nano-Imprinting Guide

机译：在纳米压印指南上使用定向自组装进行亚15纳米构图技术
- 作者：Seiji Morita;Masahiro Kanno;Ryosuke Yamamoto;Norikatsu Sasao;Shinobu Sugimura
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Lithography;
- Nano-imprint;
- NIL;
- DSA;
- Shrink;
- UV resin;
- Organic material;
- Block copolymer;
35.Numerical placement analysis in hole multiplication patterns for directed self-assembly

机译：定向自组装的孔倍增模式中的数值放置分析
- 作者：K. Yamamoto;T. Nakano;M. Muramatsu;H. Genjima;T. Tomita;K. Matsuzaki;T. Kitano
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
36.Sub-10 nm lines and spaces patterning using grapho-epitaxial directed self-assembly of lamellar block copolymers

机译：层状嵌段共聚物的石墨外延定向自组装形成亚10纳米线和空间
- 作者：Yuriko Seino;Hironobu Sato;Yusuke Kasahara;Shinya Minegishi;Ken Miyagi;Hitoshi Kubota;Hideki Kanai;Katsuyoshi Kodera;Masayuki Shiraishi;Naoko Kihara;Yoshiaki Kawamonzen;Toshikatsu Tobana;Katsutoshi Kobayashi;Hitoshi Yamano;Satoshi Nomura;Tsukasa Azuma
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- grapho-epitaxial directed self-assembly;
- lamellar block copolymer;
- line-and-space pattern;
37.Chemoepitaxial guiding underlayers for density asymmetric and energetically asymmetric diblock copolymers

机译：化学外延导向底层，用于密度不对称和能量不对称的二嵌段共聚物
- 作者：Benjamin D. Nation;Peter J. Ludovice;Clifford L. Henderson
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- directed self-assembly;
- block copolymer;
- simulation;
- chemoepitaxy;
- molecular dynamics;
- process window;
38.Lithography Alternatives meet Design Style Reality; How do they 'Line' Up?

机译：平版印刷术可以满足设计风格的现实要求;他们如何“排队”？
- 作者：Michael C. Smayling
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Low k_1;
- 1D design style;
- gridded design rules;
- pitch division;
- lines and cuts;
- design source mask optimization (DSMO);
- self-aligned pitch division;
- DSA;
- CEBL;
39.Contact Hole Patterning by Electric-Field Assisted Assembly of Core-Shell Nanoparticles

机译：电场辅助核壳纳米粒子组装的接触孔图案化
- 作者：Xuexue Guo;Lan Lin;Theresa S. Mayer
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
40.Enhanced Patterning by Tilted Ion Implantation

机译：通过倾斜离子注入增强图案
- 作者：Sang Wan Kim;Peng Zheng;Kimihiko Kato;Leonard Rubin;Tsu-Jae King Liu
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- alternative lithography;
- tilted ion implantation;
- self-align;
- low-cost;
- structural damage;
- enhanced etch rate;
41.Nanoimprint lithography using disposable biomass template

机译：使用一次性生物质模板的纳米压印光刻
- 作者：Makoto Hanabata;Satoshi Takei;Kigen Sugahara;Shinya Nakajima;Naoto Sugino;Takao Kameda;Jiro Fukushima;Yoko Matsumoto;Atsushi Sekiguchi
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- thermal nanoimprint lithography;
- template;
- mold;
- biomass;
- cellulose;
- defect reduction;
42.Improved cost-effectiveness of the block co-polymer anneal process for DSA

机译：改进的DSA嵌段共聚物退火工艺的成本效益
- 作者：Hari Pathangi;Maarten Stokhof;Werner Knaepen;Varun Vaid;Arindam Mallik;Boon Teik Chan;Nadia Vandenbroeck;Jan Willem Maes;Roel Gronheid
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Directed self-assembly;
- chemo epitaxy;
- defect reduction;
- cost of ownership;
- batch anneal;
43.NIL defect performance toward High volume mass production

机译：面向大批量生产的NIL缺陷性能
- 作者：Masayuki Hatano;Kei Kobayashi;Hiroyuki Kashiwagi;Hiroshi Tokue;Takuya Kono;Nakasugi Tetsuro;Eun Hyuk Choi;Wooyung Jung
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Nanoimprint;
- Lithography;
- Template;
- Defect classification;
- Defect control;
44.DSA materials contributions to the defectivity performance of 14 nm half-pitch LiNe flow @ imec

机译：DSA材料有助于14 nm半节距LiNe流动@ imec的缺陷性能
- 作者：Hari Pathangi;Varun Vaid;Boon Teik Chan;Nadia Vandenbroeck;Jin Li;Sung Eun Hong;Yi Cao;Baskaran Durairaj;Guanyang Lin;Mark Somervell;Takahiro Kitano;Ryota Harukawa;Kaushik Sah;Andrew Cross;Hareen Bayana;Lucia DUrzo;Roel Gronheid
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Directed self-assembly;
- chemo epitaxy;
- defect reduction;
- DSA materials;
- Block-co polymer defectivity;
45.Resist roughness improvement by chemical shrink process

机译：通过化学收缩工艺提高粗糙度
- 作者：Tatsuro Nagahara;Takashi Sekito;Yuriko Matsuura
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- NTD;
- LWR;
- LER;
- CDU;
- pattern roughness;
- ArF;
- EUV;
- shrink;
- SPM;
- AFM;
46.Deep-UV Interference Lithography combined with Masked Contact Lithography for Pixel Wiregrid Patterns

机译：深紫外干涉光刻技术与掩膜接触光刻技术相结合的像素线栅图案
- 作者：David Lombardo;Piyush Shah;Pengfei Guo;Andrew Sarangan
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- Interferometric;
- deep-UV;
- wiregrid polarizers;
47.Grapho-epitaxial sub-10-nm line and space patterning using lamella-forming Si-containing block copolymer

机译：使用形成薄片的含硅嵌段共聚物进行Grapho外延亚10纳米以下的线和空间构图
- 作者：Hironobu Sato;Yusuke Kasahara;Naoko Kihara;Yuriko Seino;Ken Miyagi;Shinya Minegishi;Hitoshi Kubota;Katsutoshi Kobayashi;Hideki Kanai;Katsuyoshi Kodera;Yoshiaki Kawamonzen;Masayuki Shiraishi;Hitoshi Yamano;Satoshi Nomura;Tsukasa Azuma;Teruaki Hayakawa
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- PMAPOSS-b-PTFEMA;
- grapho-epitaxy;
- cross-sectional TEM;
- pattern transfer;
48.Reversible Nano-Lithography for Commercial Approaches

机译：商业方法的可逆纳米光刻
- 作者：Jae Hong Park;Hyun Ik Jang;Woo Choong Kim;Hae Su Yun;Jun Yong Park;Seok Woo Jeon;Hee Yeoun Kim;Chi Won Ahn
- 会议名称：《Conference on alternative lithographic technologies VII》 | 2016年
- nano patterning;
- nano structure;
- lithography;
- soft;
- molding;
- imprinting;
- commercialization;