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首页> 外文期刊>Journal of optoelectronics and advanced materials >The effects of the interfacial layer with interface states on controlling the electronic properties of Au-GaAs Schottky diode
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The effects of the interfacial layer with interface states on controlling the electronic properties of Au-GaAs Schottky diode

机译:具有界面状态的界面层对控制Au / n-GaAs肖特基二极管电子性能的影响

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摘要

The electrical characteristics and interface state density properties of Au/insulator-GaAs (MIS metal-insulator- semiconductor) diodes with insulator layers having different thickness have been analyzed by current-voltage and capacitance-voltage techniques at room temperature. The barrier height and ideality factor values for MIS Schottky diodes were found to be 0.66 eV, 1.67 and 0.86 eV, 3.75, respectively. The diodes show a non-ideal I-V behavior with the ideality factor greater than unity. This behavior is attributed to the interfacial insulator layer and the interface states. The obtained results show that the insulator layer modifies the electrical parameters such as interface state density, series resistance and reduces the reverse bias leakage current by more than two orders of magnitude. In addition, the interface distribution profiles (Dit) were extracted from the I-V measurements by taking into account the bias dependence of the effective barrier height for the Schottky diode. The energy distribution curves of the interface states of each sample were determined. The interface state density N _(ss) of the diodes was changed from 4.7x10 ~(12) eV ~(-1) cm ~(-2) in (Ec-0.647) eV to 6.35x10 ~(14) eV ~(-1) cm ~(-2) in (Ec-0.619) eV for the initial sample AuD1 MIS diode and from 2.67x10 ~(15) eV ~(-1) cm ~(-2) in (Ec-0.850) eV to 1.01x10 ~(15) eV ~(-1).cm ~(-2) in (Ec-0.756) eV for AuD2 MIS diode.
机译:已经通过室温下的电流-电压和电容-电压技术分析了具有不同厚度的绝缘体层的Au /绝缘体/ n-GaAs(MIS金属绝缘体-半导体)二极管的电学特性和界面态密度特性。 MIS肖特基二极管的势垒高度和理想因子值分别为0.66 eV,1.67和0.86 eV,3.75。二极管表现出非理想的I-V行为,理想因子大于1。此行为归因于界面绝缘层和界面状态。获得的结果表明,绝缘体层改变了电参数,例如界面态密度,串联电阻,并且将反向偏置泄漏电流减小了两个数量级以上。另外,通过考虑肖特基二极管的有效势垒高度的偏置依赖性,从I-V测量中提取了界面分布分布(Dit)。确定每个样品的界面态的能量分布曲线。二极管的界面态密度N _(ss)从(Ec-0.647)eV中的4.7x10〜(12)eV〜(-1)cm〜(-2)变为6.35x10〜(14)eV〜(初始样品AuD1 MIS二极管的-1)cm〜(-2)在(Ec-0.619)eV中,并且从(Ec-0.850)eV〜2.67x10〜(15)eV〜(-1)cm〜(-2)在(Ec-0.850)eV中对于AuD2 MIS二极管,在(Ec-0.756)eV中达到1.01x10〜(15)eV〜(-1).cm〜(-2)in(Ec-0.756)eV。

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