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Density-functional calculation of hyperfine interaction constants of dangling bond and weak bond in GeN and SiN films

机译:GeN和SiN薄膜中悬键和弱键超精细相互作用常数的密度泛函计算

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In order to clarify the origin of electron spin resonance (ESR) signals for amorphous germanium nitride (a-GeN), we have carried out the density-functional calculations of N-14 hyperfine interaction constants (HFICs) for Ge-dangling bonds (Ge-DB) and weak Ge-N bonds (deformed N donor). The contribution from the N-14 HFICs of Ge-DB to the ESR line width is nearly equal to that of Si-DB. The decrease in the g-value and the line width observed for a-GeN films with the N concentration originates from a decrease in the anisotropy of the g-tensor due to an increase of the N atoms around the Ge-DBs. The N-14 HFIC calculated for the weak GeN bond with a bond length of 2.4 Angstrom gives 45 G. It is in good agreement with the hyperfine structure in the ESR signal observed for a-GeN without hydrogenation, suggesting that a-GeN films prepared by sputtering include the weak Ge-N bonds. (C) 2004 Elsevier B.V. All rights reserved.
机译:为了阐明非晶态氮化锗(a-GeN)的电子自旋共振(ESR)信号的起源,我们已经进行了Ge悬挂键(Ge)的N-14超细相互作用常数(HFIC)的密度泛函计算。 -DB)和弱的Ge-N键(变形的N供体)。 Ge-DB的N-14个HFIC对ESR线宽的贡献几乎与Si-DB相等。对于具有N浓度的a-GeN膜,观察到的g值和线宽的减小是由于g-张量的各向异性的减小,这是由于Ge-DBs周围N原子的增加所致。对键长为2.4埃的弱GeN键计算出的N-14 HFIC给出45G。这与未氢化的a-GeN的ESR信号中的超精细结构非常吻合,表明制备了a-GeN膜通过溅射包括弱的Ge-N键。 (C)2004 Elsevier B.V.保留所有权利。

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