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首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Nitrogen-doped multilayered nanographene derived from Ni3C with efficient electron field emission
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Nitrogen-doped multilayered nanographene derived from Ni3C with efficient electron field emission

机译:来自Ni3C的氮掺杂多层纳米石墨烯,具有高效的电子场发射能力

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摘要

Stability and durability are crucial to graphene-based field emitting materials. Although well-aligned N-doped graphene has a large aspect ratio and good electrical conductivity, it suffers from weak adhesion to the substrate, electric field shielding, and Joule heating effect and possible damage and collapse may result in dissatisfied field emission properties. Herein, field emitters based on N-doped multilayered nanographene derived from Ni3C films are demonstrated to have strong adhesion to the substrate and a uniform large-aspect-ratio morphology. Field-emission (FE) measurements, from the channel edges of 250 microns in depth and 1 micron in width covered with N-doped multitayer nanographene, were performed on N-doped multilayered nanographene on Ni/Si-MCPs (N-doped MLG-MCPs), revealing a small turn-on field of 0.5 V mu m(-1), a low threshold field of 1.1 V mu m(-1), and a large enhancement factor beta of 9012 at a distance of 100 mu m. In addition, the current density is 2.85 mA cm(-2) and 96.2% retention is observed after operation for 6 h. The performance and stability of N-doped MLG-MCPs are better than those reported previously from doped graphene nanostructures and comparable to those of carbon nanotubes and carbon-based nanocomposites. The materials with a well-aligned nanographene skeleton have great potential as next-generation FE electron sources.
机译:稳定性和耐久性对于基于石墨烯的场发射材料至关重要。尽管取向良好的N掺杂石墨烯具有大的长径比和良好的导电性,但是其与基底的粘附性弱,电场屏蔽和焦耳热效应以及可能的损坏和塌陷可能导致不满意的场发射性能。在此,基于源自Ni 3 C膜的N掺杂的多层纳米石墨烯的场致发射体被证明具有对基板的强粘附性和均匀的大纵横比形态。在Ni / Si-MCPs上的N掺杂多层纳米石墨烯(N掺杂MLG-N)上,从深度250微米,宽度为1微米,被N掺杂的多纳米纳米石墨烯覆盖的沟道边缘进行场发射(FE)测量。 MCPs),在100μm的距离处显示出0.5 Vμm(-1)的小开启场,1.1 Vμm(-1)的低阈值场和9012的大增强因子β。此外,电流密度为2.85 mA cm(-2),操作6小时后观察到96.2%的保留率。 N掺杂的MLG-MCP的性能和稳定性优于先前从掺杂的石墨烯纳米结构中报告的性能和稳定性,并且可与碳纳米管和碳基纳米复合材料相媲美。具有良好排列的纳米石墨烯骨架的材料具有作为下一代有限元电子源的巨大潜力。

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