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High performance H-2 evolution realized in 20 mu m-thin silicon nanostructured photocathodes

机译:在20微米薄的硅纳米结构光阴极中实现高性能H-2演化

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摘要

Thickness reduction in high-purity silicon wafers is beneficial for cost-efficient hydrogen evolution utilizing silicon photocathodes. However, two major issues need to be resolved: insufficient light absorption by a thin Si absorber and poor charge transfer reaction by dominant surface recombination. Here, we present 20 mm-thin Si photocathodes employing Pt-nanoparticle-coated silicon nanoholes that realize a photocurrent of 23 mA cm(-2) (at 0 V vs. RHE) corresponding to the amount typically achieved by a conventional wafer (similar to 200 mm-thick).
机译:高纯度硅晶片的厚度减小有利于利用硅光电阴极高效地析氢。然而,需要解决两个主要问题:薄的Si吸收剂对光的吸收不足,以及主要的表面复合导致的电荷转移反应差。在这里,我们介绍了20毫米薄的Si光电阴极,采用Pt纳米颗粒涂覆的硅纳米孔,实现了23 mA cm(-2)的光电流(在0 V对RHE时),与常规晶片(类似)通常获得的光通量相当至200毫米厚)。

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