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Growth and Characterization of High-Quality GaN Nanowires on PZnO and PGaN by Thermal Evaporation

机译:通过热蒸发法在PZnO和PGaN上生长和表征高质量GaN纳米线

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摘要

In the current research, an easy and inexpensive method is used to synthesize highly crystalline gallium nitride (GaN) nanowires (NWs) on two different substrates [i.e., porous zinc oxide (PZnO) and porous gallium nitride (PGaN)] on Si (111) wafer by thermal evaporation without any catalyst. Microstructural studies by scanning electron microscopy and transmission electron microscope measurements reveal the role of the substrates in the nucleation and alignment of the GaN NWs. Further structural and optical characterizations were performed using high-resolution X-ray diffraction, energy-dispersive X-ray spectroscopy, and photoluminescence spectroscopy. Results indicate that the NWs have a single-crystal hexagonal GaN structure and growth direction in the (0001) plane. The quality and density of GaN NWs grown on different substrates are highly dependent on the lattice mismatch between the NWs and their substrates. Results indicate that NWs grown on PGaN have better quality and higher density compared to NWs on PZnO.
机译:在当前的研究中,一种简单且廉价的方法用于在硅(111)的两个不同衬底上合成高结晶度的氮化镓(GaN)纳米线(NWs)[即多孔氧化锌(PZnO)和多孔氮化镓(PGaN)]。 )晶圆通过热蒸发而没有任何催化剂。通过扫描电子显微镜和透射电子显微镜测量进行的微结构研究揭示了衬底在GaN NW的成核和对准中的作用。使用高分辨率X射线衍射,能量色散X射线光谱和光致发光光谱进行了进一步的结构和光学表征。结果表明,NW具有单晶六方GaN结构,并且在(0001)面中具有生长方向。在不同衬底上生长的GaN NW的质量和密度高度依赖于NW及其衬底之间的晶格失配。结果表明,与PZnO上的NW相比,在PGaN上生长的NW具有更好的质量和更高的密度。

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