Interface-Modified Unipolar Resistive Random Access Memory (RRAM) Structure for Low-Power Application

摘要

An interface-engineered resistive random access memory (RRAM) using bilayer transition metal oxide (TMO) is presented for improving unipolar resistive-switching characteristics. The experiment and simulation data show that better resistive switching characteristics and superb uniformity can be realized by inserting a thin AlO_x insertion layer between the Ir/NiO interface. To elucidate the uniformity improvement of our bilayer structure, the conducting-defect effects in the resistive cell were also investigated using a random circuit breaker (RCB) simulation model. It has been verified that the forming and set characteristics are more effectively improved because the conducting-defect ratio in the insertion layer region is low, therefore making it more advantageous for a filament path controllability. Using the optimal oxygen contents in both the insertion layer and the resistive cell, it was confirmed that a significant reduction of up to 0.15 mA of the reset current (I_(RESET)) is possible compared to the conventional cell. These results indicate that new Al insertion has a large contribution to the reset and forming processes.