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首页> 外文期刊>Journal of nanoscience and nanotechnology >Nano-Scaled Pt/Ag/Ni/Au Contacts on p-type GaN for Low Contact Resistance and High Reflectivity
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Nano-Scaled Pt/Ag/Ni/Au Contacts on p-type GaN for Low Contact Resistance and High Reflectivity

机译:p型GaN上的纳米级Pt / Ag / Ni / Au触点可实现低接触电阻和高反射率

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摘要

We synthesized the vertical-structured LED (VLED) using nano-scaled Pt between p-type GaN and Ag-based reflector. The metallization scheme on p-type GaN for high reflectance and low was the nano-scaled Pt/Ag/Ni/Au. Nano-scaled Pt (5 A) on Ag/Ni/Au exhibited reasonably high reflectance of 86.2% at the wavelength of 460 nm due to high transmittance of light through nano-scaled Pt (5 A) onto Ag layer. Ohmic behavior of contact metal, Pt/Ag/Ni/Au, to p-type GaN was achieved using surface treatments of p-type GaN prior to the deposition of contact metals and the specific contact resistance was observed with decreasing Pt thickness of 5 A, resulting in 1.5 × 10~(-4) Ω·cm~2. Forward voltages of Pt (5 A)/Ag/Ni contact to p-type GaN showed 4.19 V with the current injection of 350 mA. Output voltages with various thickness of Pt showed the highest value at the smallest thickness of Pt due to its high transmittance of light onto Ag, leading to high reflectance. Our results propose that nano-scaled Pt/Ag/Ni could act as a promising contact metal to p-type GaN for improving the performance of VLEDs.
机译:我们使用p型GaN和基于Ag的反射器之间的纳米级Pt合成了垂直结构的LED(VLED)。在p型GaN上实现高反射率和低反射率的金属化方案是纳米级的Pt / Ag / Ni / Au。 Ag / Ni / Au上的纳米级Pt(5 A)在460 nm波长处显示出86.2%的合理高反射率,这是由于光通过纳米级Pt(5 A)到Ag层的透光率很高。在沉积接触金属之前,通过对p型GaN进行表面处理,可以实现接触金属Pt / Ag / Ni / Au对p型GaN的欧姆行为,并且在Pt厚度降低5 A时观察到了比接触电阻。 ,得到1.5×10〜(-4)Ω·cm〜2。 Pt(5 A)/ Ag / Ni接触到p型GaN的正向电压显示为4.19 V,注入电流为350 mA。具有各种厚度的Pt的输出电压由于在Ag上具有高的光透射率而在最小的Pt厚度下显示出最大值,从而导致高反射率。我们的研究结果表明,纳米级的Pt / Ag / Ni可以作为p型GaN的有希望的接触金属,以改善VLED的性能。

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