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首页> 外文期刊>Journal of Low Power Electronics >Circuit-Level Modeling of SRAM Minimum Operating Voltage Vddmin in the C40 Node
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Circuit-Level Modeling of SRAM Minimum Operating Voltage Vddmin in the C40 Node

机译:C40节点中SRAM最低工作电压Vddmin的电路级建模

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The minimum operating voltage Vddmin has been measured at low-frequency on chips manufactured in C40 technology node, on a large bitcell and a small, high-density bitcell. Vddmin has been modeled by two methods based on standard Quasi-Monte Carlo (QMC), and by a method named one-Dimensional QMC (1D-QMC), based on the statistical evaluation of the bitcell stability over the full variability space. The QMC@TT and QMC@WC methods are very accurate in predicting Vddmin at 50% or 95% yield levels, respectively, the latter method requiring one fit parameter. The 1D-QMC model agrees within 15 mV with the experimental Vddmin distribution, without the need of any fit parameters.
机译:最小工作电压Vddmin已在C40技术节点中制造的芯片上,大型位单元和小型高密度位单元上以低频测量。 Vddmin已通过基于标准准蒙特卡洛(QMC)的两种方法和基于一维QMC(1D-QMC)的方法进行建模,该方法基于对整个可变性空间上位单元稳定性的统计评估。 QMC @ TT和QMC @ WC方法在预测50%或95%产率水平下的Vddmin时非常准确,后一种方法需要一个拟合参数。 1D-QMC模型与实验Vddmin分布在15 mV范围内相吻合,而无需任何拟合参数。

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