Study of static electricity in wafer cleaning process

摘要

Static electricity has always received attention as a major factor in yield loss for the semiconductormanufacturing process. The problems related to static electricity are particle attachment to the wafersurface by electrostatic attraction [1] and pattern (device) damage by electrostatic discharge.Moreover, there are also concerns for the ignition of organic solvents and the related fire orexplosion hazards. So, controlling static electricity is very important for improving yields andsafety.