Study of static electricity in wafer cleaning process

摘要

Static electricity has always received attention as a major factor in yield loss for the semiconductor manufacturing process. The problems related to static electricity are particle attachment to the wafer surface by electrostatic attraction [1] and pattern (device) damage by electrostatic discharge Moreover, there are also concerns for the ignition of organic solvents and the related fire or explosion hazards So, controlling static electricity is very important for improving yields and safety.