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Defect engineering in 2D photonic crystals fabricated by electrochemical etching of silicon

机译:通过硅的电化学刻蚀制造的二维光子晶体中的缺陷工程

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摘要

We propose electro-tunable composite structure of microcavity based on silicon 2D photonic crystal bar with a trench defect infiltrated with a liquid crystal. The device is fabricated by joint photo-electrochemical etching of deep macropores and trenches with subsequent trench opening from the substrate side. The optimized geometry and etching regime enables to minimize the lattice distortion introduced by trenches and to reduce roughness of the trench side walls. It was demonstrated that the structures with reach- through trenches and dead-end macropores are suitable for selective filling with a liquid crystal.
机译:我们提出了一种基于硅2D光子晶体棒的微腔电可调复合结构,该结构具有注入液晶的沟槽缺陷。该装置是通过对深大孔和沟槽进行联合光电化学蚀刻,并随后从衬底侧开口而制成的。优化的几何形状和蚀刻方案能够最大程度地减少沟槽引入的晶格畸变并降低沟槽侧壁的粗糙度。已经证明具有贯通沟槽和死角大孔的结构适合于选择性地填充液晶。

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