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Electromigration-Induced Bi Segregation in Eutectic SnBi Solder Joint

机译:共晶SnBi焊点中电迁移诱导的Bi偏析

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摘要

Effects of current stressing of 6.5 X 10~(3) A/cm~(2) on the eutectic SnBi solder joint at 70 deg C were investigated. The Bi segregation at the anode side was found, and the Bi segregation layer grew with the increasing stressing time. The Bi segregation may result in the strength reduction and the more serious Joule heating due to the brittleness and the higher resistivity of Bi, respectively. Effects of the solder microstructure and the current density on the Bi segregation were also investigated. By preannealing the solder joint at 120 deg C for 192 h to 360 h before current stressing, the growth rate of the Bi segregation layer was significantly reduced due to the reduction of the density of the interphase boundary. The layer growth rate was also greatly reduced by reducing the current density from 6.5 X 10~(3) A/cm~(2) to 5 X 10~(3) A/cm~(2).
机译:研究了在70℃下6.5 X 10〜(3)A / cm〜(2)的电流应力对SnBi共晶焊点的影响。发现在阳极侧Bi偏析,并且Bi偏析层随着应力时间的增加而增长。由于Bi的脆性和较高的电阻率,Bi的偏析可能导致强度降低和更严重的焦耳热。还研究了焊料微结构和电流密度对Bi偏析的影响。通过在电流应力之前在120摄氏度下将焊点预退火192 h至360 h,由于相界面边界密度的降低,Bi偏析层的生长速率显着降低。通过将电流密度从6.5 X 10〜(3)A / cm〜(2)降低到5 X 10〜(3)A / cm〜(2),也大大降低了层的生长速率。

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