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Development of Molecular Beam Epitaxially Grown Hg_(1-x)Cd_xTe for High-Density Vertically-Integrated Photodiode-Based Focal Plane Arrays

机译:分子束外延生长的Hg_(1-x)Cd_xTe用于高密度垂直集成光电二极管焦平面阵列的开发

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Hg_(1-x)Cd_xTe samples of x ~ 0.3(in the midwave infrared,or MWIR,spectral band)were prepared by molecular beam epitaxy(MBE)for fabrication into 30-mu m-pitch,256 x 256,front-side-illuminated,high-density vertically-integrated photodiode(HDVIP)focal plane arrays(FPAs).These MBE Hg_(1-x)Cd_xTe samples were grown on CdZnTe(211)substrates prepared in this laboratory;they were ~10-mu m thick and were doped with indium to ~5 x 1014 cm"3.Standard HDVIP process flow was employed for array fabrication.Excellent array performance data were obtained from these MWIR arrays with MBE HgCdTe material.The noise-equivalent differential flux(NEAO)operability of the best array is 99.76%,comparable to the best array obtained from liquid-phase epitaxy(LPE)material prepared in this laboratory.
机译:通过分子束外延(MBE)制备x〜0.3(在中波红外或MWIR谱带中)的Hg_(1-x)Cd_xTe样品,以制造30μm间距256 x 256的正面照明的高密度垂直集成光电二极管(HDVIP)焦平面阵列(FPA)。这些MBE Hg_(1-x)Cd_xTe样品在该实验室准备的CdZnTe(211)衬底上生长;它们的尺寸约为10微米厚,并用铟掺杂至〜5 x 1014 cm“ 3。采用标准的HDVIP工艺流程进行阵列制造。从这些采用MBE HgCdTe材料的MWIR阵列获得了出色的阵列性能数据。等效噪声通量(NEAO)可操作性最佳阵列的百分数为99.76%,与本实验室制备的液相外延(LPE)材料获得的最佳阵列相比。

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