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首页> 外文期刊>Journal of Electronic Materials >Effect of pH on Structural and Electrical Properties of Electrodeposited Bi_(2)Te_(3) Thin Films
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Effect of pH on Structural and Electrical Properties of Electrodeposited Bi_(2)Te_(3) Thin Films

机译:pH对电沉积Bi_(2)Te_(3)薄膜结构和电性能的影响

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Bi_(2)Te_(3) thin films were electrodeposited at various pH values of a bismuth nitrate and tellurium oxide plating solution. Enhancement in pH results in a decrease in grain size. Transmission electron microscopy reveals the transformation of the film morphology from dispersed nanoparticles to connected chain-like nanostructures of Bi_(2)Te_(3) as pH is increased. Electrical characterization for samples deposited in the temperature range of 300 K to 425 K shows a fourfold increase in Seebeck coefficient, S, between its maximum and minimum value as the solution pH changes from 1 to 3.5. Such enhancement of S is attributed to the increased connectivity of the nanostructures at higher pH.
机译:在硝酸铋和氧化碲镀液的各种pH值下电沉积Bi_(2)Te_(3)薄膜。 pH值提高导致晶粒尺寸减小。透射电子显微镜揭示了随着pH值的升高,薄膜的形态从分散的纳米颗粒转变为Bi_(2)Te_(3)的连接的链状纳米结构。在300 K至425 K温度范围内沉积的样品的电学特性表明,随着溶液pH从1变为3.5,塞贝克系数S在其最大值和最小值之间增加了四倍。 S的这种增强归因于在较高pH下纳米结构的增加的连通性。

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