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Effects of Substrate Metallization on Solder/Under-Bump Metallization Interfacial Reactions in Flip-Chip Packages during Multiple Reflow Cycles

机译:多个回流周期中衬底金属化对倒装芯片封装中焊锡/凸点下金属化界面反应的影响

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摘要

The effects of various elements of substrate metallization, namely, Au, Ni, and P, on the solder/under-bump metallization (UBM), (Al/Ni(V)/Cu) interfacial reactions in flip-chip packages during multiple reflow processes were systematically investigated. It was found that Au and P had negligible effects on the liquid-solid interfacial reactions. However, Ni in the substrate metallization greatly accelerated the interfacial reactions at chip side and degraded the thermal stability of the UBM through formation of a (Cu, Ni)_6Sn_5 ternary compound at the solder/UBM interface. This phenomenon can be explained in terms of enhanced grain-boundary grooving on (Cu, Ni)_6Sn_5 in the molten solder during the reflow process. This could eventually cause the rapid spalling of an intermetallic compound (IMC) from the solder/UBM interface and early failure of the packages. Our results showed that formation of multicomponent intermetallics, such as (Cu,Ni)_6Sn_5 or (Ni,Cu)_3Snd_4, at the solder/UBM inter-face is detrimental to the solder-joint reliability.
机译:多次回流期间,衬底金属化的各种元素(金,镍和磷)对倒装芯片封装中焊料/凸点金属化(UBM),(Al / Ni(V)/ Cu)界面反应的影响过程进行了系统地调查。发现金和磷对液-固界面反应的影响可忽略不计。然而,通过在焊料/ UBM界面处形成(Cu,Ni)_6Sn_5三元化合物,基板金属化中的Ni极大地加速了芯片侧的界面反应,并降低了UBM的热稳定性。可以通过在回流过程中在熔融焊料中的(Cu,Ni)_6Sn_5上增强晶界开槽来解释这种现象。这最终可能导致焊料/ UBM界面金属间化合物(IMC)迅速剥落,并使封装过早失效。我们的结果表明,在焊料/ UBM界面处形成多组分金属间化合物,例如(Cu,Ni)_6Sn_5或(Ni,Cu)_3Snd_4,对焊点可靠性是有害的。

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