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首页> 外文期刊>Journal of Electronic Materials >Mitigation of Sn Whisker Growth by Composite Ni/Sn Plating
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Mitigation of Sn Whisker Growth by Composite Ni/Sn Plating

机译:Ni / Sn复合镀层减轻Sn晶须生长

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摘要

This paper considers the influence of composite pulse electroplated nickel/tin (Ni/Sn) layering on the mitigation of Sn whisker growth. The performance of the composite pulsed plating method in the mitigation of Sn whisker growth is also compared with two other plating procedures. The results indicate that, after a period of 6 months, the composite pulsed plating technique demonstrates much better resistance to Sn whisker growth than other plating techniques such as pure Sn plating and Sn plating with a Ni underlayer onto a brass substrate subjected to various environmental conditions. The primary conclusions are based on the analysis of microstructural characteristics, the average residual stress distribution in the film over different time periods computed by x-ray diffraction, the formation of intermetallic compounds, and the amount of Sn whisker growth in each case.
机译:本文考虑了复合脉冲电镀镍/锡(Ni / Sn)层对减轻锡晶须生长的影响。还将复合脉冲电镀方法在缓解锡晶须生长方面的性能与其他两种电镀工艺进行了比较。结果表明,经过6个月的时间,复合脉冲电镀技术显示出比其他电镀技术更好的抵抗锡晶须生长的能力,例如纯锡电镀和在各种环境条件下在黄铜基板上进行镍底层镀锡的其他电镀技术。初步结论是基于对微观结构特征的分析,通过x射线衍射计算的不同时间段内薄膜中的平均残余应力分布,金属间化合物的形成以及每种情况下锡晶须的生长量。

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