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首页> 外文期刊>Journal of Electronic Materials >Study of Threading Dislocations in the Plan-View Sample of SiGe/Si(001)Superlattices by Transmission Electron Microscopy
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Study of Threading Dislocations in the Plan-View Sample of SiGe/Si(001)Superlattices by Transmission Electron Microscopy

机译:透射电子显微镜研究SiGe / Si(001)超晶格平面视图样品中的螺纹位错

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摘要

Interfacial defects due to a mismatch of 1.378% between substrate and epi-layer were examined in a Si_(0.67)Ge_(0.33)/Si(001)superlattice by transmission electron microscopy(TEM).Plan-view specimens from the superlattice were prepared to investigate the defects in the structure.It was observed that 60deg-type misfit dislocations associate with point contrast on and at their ends.This point contrast was found to represent threading dislocations by using tilt experiments in the microscope.Consequently,stereo electron microscopy was used to examine the threading dislocations.It was discovered that the threading dislocations are not on the {111} slip planes but can be almost parallel to the [001] zone axis.
机译:通过透射电子显微镜(TEM)在Si_(0.67)Ge_(0.33)/ Si(001)超晶格中检查了由于衬底和外延层之间1.378%的不匹配而导致的界面缺陷。从超晶格制备了平面样品观察到60deg型错配位错与端部和端部的点对比有关。通过显微镜的倾斜实验,发现该点对比代表了螺纹位错。用于检查螺纹位错。发现螺纹位错不在{111}滑移面上,而是几乎平行于[001]区域轴。

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