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首页> 外文期刊>Journal of Electronic Materials >On the inetics of the activation of arsenic as a p-type dopant in Hg_(1-x)Cd_xTe
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On the inetics of the activation of arsenic as a p-type dopant in Hg_(1-x)Cd_xTe

机译:关于Hg_(1-x)Cd_xTe中砷作为p型掺杂剂的活化的理论

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摘要

The kinetics of the activation of arsenic in Hg_(1-x)Cd_xTe into an an acceptor state is discussed basedon a new model.In this model,it is assumed that the rate-limiting step is the out-diffusion of the excess tellurium that is produced as an arsenic atom jumps from a metal sublattice site to a tellurium sublattic esite.In this paper,the model is extended to incorporate additional data from the literature.It is shown that arsenic activation can be accomplished by mercury-rich anneals in reasonable times,over a wide range of temperatures,extending as low as 250degC.
机译:基于一个新模型讨论了Hg_(1-x)Cd_xTe中砷活化为受体状态的动力学。在该模型中,假设限速步骤是过量碲的向外扩散,即当砷原子从金属亚晶格位跃迁到碲亚晶格位时产生。本文对该模型进行了扩展,以结合文献中的其他数据。结果表明,可以通过合理的富汞退火来实现砷的活化。在宽广的温度范围内,温度低至250摄氏度。

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