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首页> 外文期刊>Journal of electroceramics >Effect of Zr/Ti Ratio on Microstructure and Electrical Properties of Lead Zirconate Titanate Thin Films Derived by Pulsed Laser Deposition
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Effect of Zr/Ti Ratio on Microstructure and Electrical Properties of Lead Zirconate Titanate Thin Films Derived by Pulsed Laser Deposition

机译:Zr / Ti比对脉冲激光沉积制备锆钛酸铅钛薄膜的微观结构和电性能的影响

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摘要

PZT films were fabricated using various targets of Pb(Zr{sub}xTi{sub}(1-x)O{sub}3 with Zr/Ti ratios of 70/30, 58/42, 52/48, 45/55 and 30/70, and with excess PbO of 20 wt% on Pt/Ti/SiO{sub}2/Si(100) substrates. The rosette structure was observed in the films derived from the target with a Zr/Ti ratio of 70/30 and disappeared with increasing titanium composition. The observations on surface and cross-sectional microstructure were consistent with a higher perovskite nucleation for the higher Ti content films. The PZT films derived from the target with a Zr/Ti ratio of 45/55 had a polycrystalline columnar microstructure extending throughout the thickness of the film and no pyrochlore phase on the surface was observed. The PZT films derived from the target with a Zr/Ti ratio of 45/55 exhibited better electric properties than those derived from the target with a Zr/Ti ratio of 52/48.
机译:使用Zr / Ti比为70 / 30、58 / 42、52 / 48、45 / 55和Pb(Zr {sub} xTi {sub}(1-x)O {sub} 3的各种靶材制造PZT膜30/70,并且在Pt / Ti / SiO {sub} 2 / Si(100)衬底上具有20 wt%的过量PbO。在靶材中Zr / Ti比为70 / 30并随着钛成分的增加而消失,表面和横截面显微组织的观察结果与较高Ti含量的膜的钙钛矿成核一致,Zr / Ti比为45/55的靶材得到的PZT膜具有Zr / Ti比为45/55的靶材所形成的PZT薄膜的电学性能优于Zr / Ti比为45/55的靶材所形成的PZT薄膜。 / Ti比为52/48。

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