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首页> 外文期刊>Journal of Applied Crystallography >Aging-time-resolved in situ microstructural investigation of tin films electroplated on copper substrates, applying two-dimensional-detector X-ray diffraction
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Aging-time-resolved in situ microstructural investigation of tin films electroplated on copper substrates, applying two-dimensional-detector X-ray diffraction

机译:应用二维探测器X射线衍射技术对镀在铜基板上的锡膜进行时效分辨的原位显微组织研究

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摘要

Pure thin tin films, electroplated on copper substrates, were investigated by in situ X-ray diffraction analysis during room-temperature aging, using a laboratory diffractometer equipped with a two-dimensional detector. Diffraction spots of single Sn grains in the Sn film could be observed and traced over time by using the diffraction method adopted. For the as-deposited specimens, striking changes of the Sn reflection spots, concerning their position and intensity, as well as sudden appearances and disappearances of additional diffraction spots, were observed. This could be ascribed to local microstructural changes in the films such as grain rotation, grain growth and grain dissolution. In contrast to the as-deposited specimens, so-called post-baked specimens (i.e. annealed at 423K for 1h after layer deposition) exhibited a stable microstructure. The results obtained are discussed with respect to their relevance for the Sn whisker-growth phenomenon.
机译:使用配备有二维检测器的实验室衍射仪,通过在室温老化过程中进行原位X射线衍射分析,研究了电镀在铜基板上的纯锡薄膜。通过采用所采用的衍射方法,可以观察到并随时间追踪Sn膜中单个Sn晶粒的衍射点。对于沉积的样品,观察到锡反射点的显着变化,涉及其位置和强度,以及其他衍射点的突然出现和消失。这可以归因于膜的局部微观结构变化,例如晶粒旋转,晶粒生长和晶粒溶解。与沉积后的样品相反,所谓的后烘烤样品(即在层沉积后在423K退火1h)表现出稳定的微观结构。讨论了所得结果与锡晶须生长现象的相关性。

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