Microstructure of SnS Thin Films Obtained by Hot Wall Vacuum Deposition Method

摘要

SnS thin films within the thickness range of 0.5-12 (mu)m were obtained on pure and Mo-coated glass substrates by the hot wall vacuum deposition method (HWVD). Detailed microstructure of these materials was examined using X-Ray diffraction, Auger electron spectroscopy, Scanning electron microscopy and Atomic force microscopy. The SnS layers are single-phase with mostly uniform depth distribution of the elements. Tin sulfide films on pure glass substrates show (111) or (010) preferred orientations, while the films on Mo-coated glass substrates are oriented only along (111) plane. As revealed by Scanning electron microscopy (SEM) SnS thin films are polycrystalline with pinhole-free densely packed microstructure and strongly adhered to the substrate surface. The surface roughness mean values (R_(a)) are in range of 50-65 nm for SnS films grown on pure glass and in range of 55-150 nm for the films grown on Mo-coated glass. The R_(a) value increases with increasing of substrate temperature.