XAFS Studies of TiSi2 and CoSi2 Thin Films at the Ti, Co and Si K-Edge

摘要

XAFS measurements at the metal and Si K-edge have been made for a series of TiSi, and CoSi2 blanket salicide films as well as bulk CoSij and TiSi2. It was found that the films have essentially the same structure as the bulk TiSi, and CoSij and that the Si XANES exhibit very rich structures. Both the materials characterization and spectroscopy aspects of the XAFS are discussed.