Provided is a sputtering target of sintered Ti-Nb based oxide, wherein the sputtering target consists of titanium (Ti), niobium (Nb), and remainder being oxygen and unavoidable impurities, and the atomic ratio of Ti and Nb is 0.39 ‰¦ (Nb/(Ti + Nb)) ‰¦ 0.79. The sputtering target of sintered Ti-Nb based oxide has a high refractive index and a low extinction coefficient. Also provided is a thin film of Ti-Nb based oxide obtained by using the foregoing target, which enables high-rate deposition. The thin films has superior transmittance, is subject to minimal reduction and variation of reflectivity, and is useful as an interference film or a protective film of an optical information recording medium, or as a part of a constituent layer of an optical recording medium. The thin film can also be applied to a glass substrate; that is, it can be used as a heat reflecting film, an antireflection films or an interference filter,
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机译：提供了一种烧结的Ti-Nb基氧化物的溅射靶，其中所述溅射靶由钛（Ti），铌（Nb）组成，其余为氧和不可避免的杂质，且Ti和Nb的原子比为0.39‰（ Nb /（Ti + Nb））‰±0.79。烧结的Ti-Nb基氧化物的溅射靶具有高折射率和低消光系数。还提供了通过使用前述靶获得的Ti-Nb基氧化物的薄膜，其能够实现高速率沉积。所述薄膜具有优异的透射率，经受最小的反射率变化和变化，并且可用作光学信息记录介质的干涉膜或保护膜，或用作光学记录介质的构成层的一部分。薄膜也可以施加到玻璃基板上。也就是说，它可以用作热反射膜，抗反射膜或干涉滤光片，
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