Dynamical aspects of the surface layer build up on diamond and improvement of the conductivity stability

摘要

In order to improve the reliability of the H surface layer properties and their long-term stability required for electronic device fabrication,in-situ measurements of the surface conductivity were performed after hydrogen plasma treatments to assess the parameters that are most affecting the conductivity.By using an optimised in-situ configuration,the influence of the gaseous environment after plasma treatment,as well as the temporal aspects of the rise of the surface conductivity were analysed.The importance of each step influencing the surface properties can be independently studied in order to check these effects,and namely the type and duration of several treatments,surface temperature,gaseous environments and electrical biasing of the contacts,the latter being responsible for attracting or repulsing ions from the diamond surface.Further,the dynamical aspects of the variation in conductivity and the time concerned to reach the surface conductivity with respect to the sample environments are also addressed.