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Ion Beam Induced Charge characterization of epitaxial single crystal CVD diamond

机译:离子束诱导的外延单晶CVD金刚石的电荷表征

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IBIC (Ion Beam Induced Charge) technique has been used in order to characterize single crystal epitaxial CVD diamond film with respect to homogeneity and stability of the response (in terms of charge collection efficiency, cce) as a function both of counting rate and of the number of counts per unit surface area. The maximum shift of cce peak, under a 1.2 MeV proton microbeam, is 1.5 percent for counting rates from 43 to 4330 Hz, while the homogeneity, evaluated as the standard deviation with respect to the average value of cce over strip-like regions 60-100 mu m wide and 800-1200 mu m long, is 0.5 percent. Counting rates per unit surface area were between 30 and about 15,000 Hz/mm~2. A total number of counts per unit area up to 9 10~6 counts/mm2 was reached without noticing any polarization effect due to trapped charge. Moreover, the functionality of a new kind of bulk electrode, realized by a boron doped buffer layer laterally contacted with Ag paste, has been checked by measuring cce at different proton ranges.
机译:IBIC(离子束感应电荷)技术已被用于表征单晶外延CVD金刚石膜的响应均匀性和稳定性(以电荷收集效率cce计),其与计数率和计数率有关。每单位表面积的计数数。对于从43到4330 Hz的计数率,在1.2 MeV质子微束下cce峰的最大位移为1.5%,而均质性被评估为相对于条状区域60-cce平均值的标准偏差的标准偏差。宽100微米,长800-1200微米,为0.5%。每单位表面积的计数率在30和约15,000Hz / mm 2之间。单位面积的总数达到9 10〜6 counts / mm2,而没有注意到由于捕获的电荷而产生的极化效应。此外,已经通过在不同质子范围内测量cce来检查一种新型的体电极的功能,该功能是通过将掺杂硼的缓冲层与Ag膏横向接触来实现的。

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