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Electrochemical properties of undoped hydrogen terminated CVD diamond

机译:未掺杂氢封端CVD金刚石的电化学性能

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The electronic properties of hydrogen terminated intrinsic single crystalline CVD diamond in redox-electrolytic solutions are characterized by cyclic voltammetry experiments and pH-sensitive measurements of ion-sensitive field effect transistor (ISFET) structures. The data show insulator-metal transitions of diamond if immersed into redox-electrolyte solutions with chemical potentials (unoccupied states) below the valence-band maximum. Cyclic voltammetry current peaks are electron exchange rate limited due to the small density of holes in a few Angstrom thick conducting layer at the surface of diamond. H-terminated diamond is sensitive to pH of electrolytes, following the Nernst prediction with about -58 mV/pH. Due to Coulomb repulsion of H~(+)-ions from the H-terminated diamond surface, the enlarged tunneling distance works like a gate insulator and is indicated as reason for the confinement of holes in ISFET structures.
机译:通过循环伏安实验和离子敏感场效应晶体管(ISFET)结构的pH敏感测量,表征了氢端接的本征单晶CVD金刚石在氧化还原溶液中的电子性能。数据显示,如果钻石的化学势(未占据状态)低于价带最大值,则将其浸入氧化还原-电解质溶液中时,金刚石的绝缘体-金属过渡。由于金刚石表面几埃厚的导电层中空穴的密度很小,循环伏安法电流峰值受到电子交换速率的限制。 H能终止的金刚石对电解质的pH敏感,遵循能斯特(Nernst)预测,约为-58 mV / pH。由于H〜(+)离子从氢封端的金刚石表面被库仑排斥,因此增大的隧穿距离像栅极绝缘体一样起作用,并被认为是ISFET结构中空穴受限的原因。

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