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Tungsten carbide Schottky contact to diamond toward thermally stable photodiode

机译:碳化钨肖特基与金刚石的接触朝向热稳定的光电二极管

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We use tungsten carbide-based Schottky and ohrnic contacts for the fabrication of deep ultraviolet (DUV) photodiodes on boron-doped homoepitaxial diamond layers. The photodiode is isothermally annealed at 500 deg C in argon ambient in order to investigate the thermal stability of the electrical and optical properties. The ideality factor is improved to be an ideal value of unity after annealing for 1 h and becomes around 1.5 after subsequent annealing for longer time durations. The leakage current for at least 30 V reverse bias is lower than 10~(14) A before and after annealing for 4 h. The photoresponsivity at 220 nm is enhanced dramatically by a factor of 10~3 after annealing, resulting in a DUV/visible blind ratio as large as 10~6 at the reverse bias of 2 V. The work is expected to open a way for developing thermally-stable Schottky contacts to diamond.
机译:我们使用基于碳化钨的肖特基和椭圆形触点在掺硼的同质外延金刚石层上制造深紫外(DUV)光电二极管。为了研究电学和光学性质的热稳定性,在氩气环境中将光电二极管在500摄氏度下等温退火。理想化系数提高到退火1小时后的理想单位值,并在后续退火更长的时间后变为1.5左右。退火4 h之前和之后,至少30 V反向偏置的泄漏电流低于10〜(14)A。退火后,在220 nm处的光响应度显着提高了10〜3倍,在2 V的反向偏压下,DUV /可见盲比高达10〜6。有望为这项工作开辟一条道路金刚石的热稳定肖特基触点。

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