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In situ measurement of stresses in diamond-like carbon films

机译:类金刚石碳膜中应力的原位测量

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In situ determination of streses in thin films can be used as an important tool to assist process development as well as to understand the thermodynamics of film formation.A simple technique for the measurement of stresses in growing films is described here.The technique consists of measuring the displacement of a laser beam reflected from the films surface.Displacement is induced by chanages in the radius of the curvature of the substrate sesulting from stresses in the film.The detector sensitivity at the used vavelength (635 nm)is approximately 12 mV mum~-1,for which our experimental set-up is equivalent to 4 mV murad~-1.The actual data collected consist of the reflected beam displacement vs.time,and provides at any instaant the value of the average stress.By knowing the deposition rate,tiem is directly correlated with film thickness,and the local stress and be determined.Examples of measurement of stresses in teragonally bonded amorphous carbon films prepared by filtered cathodic are are presented,as well as how this technique can be used to design the deposition process to virtualy eliminate intrinsic stresses.
机译:薄膜中应力的原位测定可以用作辅助工艺开发以及了解薄膜形成的热力学的重要工具。此处介绍了一种用于测量生长薄膜应力的简单技术。该技术包括测量薄膜表面反射的激光束的位移。位移是由薄膜应力引起的基板曲率半径的变化引起的。在使用的波长(635 nm)处的检测器灵敏度约为12 mV mum。 -1,我们的实验设置等于4 mV murad〜-1。实际收集的数据包括反射光束位移与时间的关系,并在任何不变的情况下提供平均应力值。速率,膜厚与薄膜厚度,局部应力有直接关系,并可以确定。过滤阴极阴极制备的对角键合无定形碳膜的应力测量实例介绍了e,以及如何将该技术用于设计沉积过程以虚拟消除内在应力。

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