首页> 外国专利> MEASUREMENT OF FILM THICKNESS, AND MEASUREMENT OF REFRACTIVE INDEX OF DIAMOND-LIKE CARBON THIN FILM

MEASUREMENT OF FILM THICKNESS, AND MEASUREMENT OF REFRACTIVE INDEX OF DIAMOND-LIKE CARBON THIN FILM

机译:薄膜厚度的测量,以及类似钻石的碳薄膜的折射率的测量

摘要

PROBLEM TO BE SOLVED: To accurately measure, with use of near-infrared light, the film thickness and refractive index of a DLC thin film formed on outer and inner surfaces of a substrate of any shape, such as planar shape, cylindrical shape, and free shape.;SOLUTION: A product of film thickness and an refractive index is calculated by the vertically reflected interference spectrum measurement, by using as a light source, the range of wavelengths of near-infrared light, in which a diamond-like carbon thin film containing a graphite component is translucent. Furthermore, the refractive index of an identical point on a sample to be subjected to interference measurement is determined, by using an identical light source, to measure a Brewster's angle that is determined solely by the refractive index of a reflective substance, using slope incidence and reflection measuring gauge. As a result, an accurate film thickness is obtained.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:使用近红外光准确测量形成在任何形状(例如平面形状,圆柱形状和表面形状)的衬底的外表面和内表面上的DLC薄膜的膜厚和折射率。解决方案:膜厚度和折射率的乘积是通过垂直反射干涉光谱测量得出的,方法是将近红外光的波长范围用作光源,其中,类金刚石碳薄含有石墨成分的薄膜是半透明的。此外,通过使用相同的光源来确定要进行干涉测量的样品上相同点的折射率,以测量布儒斯特角,该角度仅由反射物质的折射率确定,使用斜率入射角和反射测量仪。结果,获得了准确的薄膜厚度。;版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011180113A

    专利类型

  • 公开/公告日2011-09-15

    原文格式PDF

  • 申请/专利权人 OPTO-ELECTRONICS LABORATORY INC;

    申请/专利号JP20100067060

  • 发明设计人 NAKATSUKA MASAHIRO;IZAWA YASUKAZU;

    申请日2010-03-03

  • 分类号G01B11/06;G01N21/45;G01N21/21;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:13

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