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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Effects of a ZnTe buffer layer on structural quality and morphology of CdTe epilayer grown on (001)GaAs by molecular beam epitaxy
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Effects of a ZnTe buffer layer on structural quality and morphology of CdTe epilayer grown on (001)GaAs by molecular beam epitaxy

机译:ZnTe缓冲层对(001)GaAs分子束外延生长CdTe外延层结构质量和形貌的影响

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摘要

The structural properties, crystalline quality and surface morphology of CdTe thin films without and with a ZnTe buffer layer grown on (001)GaAs by molecular beam epitaxy (MBE) have been studied. CdTe thin film directly prepared on GaAs substrate displays (111) orientation with an island growth mode, whereas the CdTe epilayers with a ZnTe buffer are (001)-oriented single-crystalline film with a two-dimensional (2D) growth mode. The morphology and surface root-mean-square (RMS) roughness of CdTe epilayers are also dramatically improved by using a ZnTe buffer. Furthermore, it is suggested that the high-temperature (HT) ZnTe buffer grown at 360 °C is more efficient for enhancing CdTe structural quality than the low-temperature (LT) one at 320°C. The CdTe epilayer on the HT-ZnTe buffer shows a narrower full-width at half-maximum (FWHM) of double-crystal X-ray rocking curve (DCXRC) for (004) reflection and a smaller RMS roughness.
机译:研究了通过分子束外延(MBE)在(001)GaAs上生长和不生长ZnTe缓冲层的CdTe薄膜的结构特性,晶体质量和表面形态。直接在GaAs衬底上制备的CdTe薄膜以岛状生长模式显示(111)取向,而具有ZnTe缓冲液的CdTe外延层是具有二维(2D)生长模式的(001)取向单晶膜。通过使用ZnTe缓冲液,CdTe外延层的形貌和表面均方根(RMS)粗糙度也得到了显着改善。此外,建议在360°C下生长的高温(HT)ZnTe缓冲液比在320°C下的低温(LT)更为有效地增强CdTe结构质量。 HT-ZnTe缓冲液上的CdTe外延层显示出(004)反射的双晶X射线摇摆曲线(DCXRC)的半峰全宽(FWHM)较窄,并且RMS粗糙度较小。

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