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Bondability of Cu wire on Cu substrate with Sn plating by ultrasonic

机译:超声镀锡对铜基体上铜线的粘接能力

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This study evaluated both the joint strength of copper wire on a copper substrate with tin plating and the joint reliability of copper wire bonding after heat treatment. The suitable tin thickness and bonding conditions, which are stage temperature, wire bonding power and bonding time, were chosen by the peel test after copper wire bonding. Tin thickness of 10 m showed a high bonding rate under the conditions of stage temperature 373 K, bonding power 500-700 mW and bonding time 30 50 ms. Before heat treatment, the peel strength of the copper wire on the copper substrate with tin plating conditions was weaker than that of gold wire on a gold substrate. After heat treatment for more than 70 h at 298 K, the peel strength of the copper wire became higher than that of the gold wire and twice as high as the initial bonding strength. The tin layer remained between the copper wire and copper substrate before heat treatment. When the samples were held at 298 K, tin reacted with copper and turned into a Cu-Sn intermetallic compound. Upon completion of this reaction at 298 K for over 70 h, the soft tin layer between the copper wire and copper substrate disappeared. Therefore, the peel strength of copper wire after heat treatment increased. These results were observed by scanning electron microscope images of the interface between the copper wire and copper substrate before and after heat treatment.
机译:本研究评估了镀锡铜基板上铜线的接头强度和热处理后铜线键合的接头可靠性。通过铜线键合后的剥离试验选择合适的锡厚度和键合条件,即平台温度,线键合功率和键合时间。在工作台温度373 K,键合功率500-700 mW和键合时间30 50 ms的条件下,10 m的锡厚度显示出较高的键合速率。在热处理之前,在镀锡条件下,铜基板上的铜线的剥离强度比金基板上的金线的剥离强度弱。在298 K下热处理70小时以上后,铜线的剥离强度变得比金线的剥离强度高,并且是初始结合强度的两倍。在热处理之前,锡层保留在铜线和铜基板之间。当样品保持在298 K时,锡与铜反应并变成Cu-Sn金属间化合物。在298 K下完成该反应70小时后,铜线和铜基板之间的软锡层消失了。因此,热处理后的铜线的剥离强度提高。通过扫描热处理前后铜线和铜基板之间的界面的电子显微镜图像观察到这些结果。

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