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Analysis and Optimal Design of a Novel SiGe/Si Power Diode for Fast and Soft Recovery

机译:用于快速和软恢复的新型SiGe / Si功率二极管的分析和优化设计

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摘要

We propose a novel p~+ (Si_(1-x)Ge_x)-~-n~+ hetero-junction power diode with three-step gradual changing doping concentration in the base region, and the structure mechanism is analysed. The fast and soft reverse recovery characteristics have been obtained and the optimal design of the changing doping concentration gradient and the percentage of Ge is carried out. Compared to the conventional structure of p~+ (Si_(1-x)Ge_x)-n~--n~+ with a constant doping concentration, the softness factor S increases nearly two times, the reverse recovery time and the peak reverse current are reduced over 15% for the device with the optimized concentration gradient, while the forward drop is almost unchanged. Taking into account of the improvement of the whole characteristics of the novel device, we obtain the optimal percentage of Ge to be 20%.
机译:提出了一种在基极区具有三步渐变掺杂浓度的新型p〜+(Si_(1-x)Ge_x)-〜-n〜+异质结功率二极管,并对其结构机理进行了分析。获得了快速和软反向恢复特性,并对变化的掺杂浓度梯度和Ge的百分比进行了优化设计。与具有恒定掺杂浓度的p〜+(Si_(1-x)Ge_x)-n〜--n〜+的常规结构相比,软度因子S几乎增加了两倍,反向恢复时间和峰值反向电流对于具有最佳浓度梯度的设备,最大降幅超过15%,而前向下降几乎不变。考虑到新型器件整体特性的改善,我们得出的最佳Ge百分比为20%。

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