首页> 外文期刊>VLSI Design >Vertical Gate RF SOI LIGBT for SPICs with Significantly Improved Latch-Up Immunity
【24h】

Vertical Gate RF SOI LIGBT for SPICs with Significantly Improved Latch-Up Immunity

机译:适用于PIC的垂直门FDSOI LIGHT,具有显着提高的闩锁抗扰性

获取原文
获取原文并翻译 | 示例
           

摘要

Based on the previous achievements in improving latch-up immunity of SOI LIGBT, process simulation on our proposed VG RF SOI NLIGBT was carried out with TCAD to provide a virtually fabricated device structure. Then, an approximate latching current model was derived according to the condition of minimum regenerative feedback couple between the parasitic dual-transistors. The model indicates that its latching current is a few orders higher than those before. Further verification through device simulation was done with TCAD, which proved that its weak snapback voltage in the off state is about 0.5-2.75 times higher than those breakdown voltages reported before, its breakdown voltage in the off state is about 19 V higher than its weak snapback voltage, and its latching current density in the on state is about 2-3 orders of magnitude higher than those reported before at room temperature due to hole current bypass through P~+ contact in P-well region. Therefore, it is characterized by significantly improved latch-up immunity.
机译:基于先前在改善SOI LIGBT的闩锁抗扰性方面的成就,我们使用TCAD对我们提出的VG RF SOI NLIGBT进行了工艺仿真,以提供虚拟制造的器件结构。然后,根据寄生双晶体管之间最小再生反馈耦合的条件,得出了一个近似的锁存电流模型。该模型表明其锁存电流比以前高几个数量级。 TCAD通过器件仿真对器件进行了进一步验证,该器件证明其在断开状态下的击穿电压比以前报道的击穿电压高约0.5-2.75倍,在断开状态下的击穿电压比其击穿电压高约19V。击穿电压及其在导通状态下的锁存电流密度比在室温下报告的值高大约2-3个数量级,这是由于空穴电流通过P阱区域中的P〜+触点旁路引起的。因此,其特征在于明显提高了闩锁抗扰性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号