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Lateral insulated gate bipolar transistors with improved latch-up immunity

机译:横向绝缘栅双极型晶体管,具有更高的闩锁抗扰性

摘要

The present invention relates generally to insulated gate transistors and more particularly, to laterally implemented insulated gate transistors having improved current capacity and improved immunity to latch-up. Specifically, it has been found that a lateral insulated gate transistor fabricated on a heavily doped substrate such as a p+ substrate exhibits improved current density. Further, the inclusion of an additional heavily doped region such as a P+ region proximate the base region contributes to improved latch-up immunity within the device.
机译:本发明一般涉及绝缘栅晶体管,更具体地说,涉及具有改进的电流容量和改进的抗闩锁性的横向实现的绝缘栅晶体管。具体地,已经发现,在重掺杂的衬底例如p +衬底上制造的横向绝缘栅晶体管表现出改善的电流密度。此外,包括靠近基极区的另外的重掺杂区,例如P +区,有助于改善器件内的闩锁免疫性。

著录项

  • 公开/公告号US4963951A

    专利类型

  • 公开/公告日1990-10-16

    原文格式PDF

  • 申请/专利权人 GENERAL ELECTRIC COMPANY;

    申请/专利号US19850803049

  • 发明设计人 DEVA N. PATTANAYAK;MICHAEL S. ADLER;

    申请日1985-11-29

  • 分类号H01L29/74;H01L27/02;H01L29/80;H01L29/40;

  • 国家 US

  • 入库时间 2022-08-22 06:06:48

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