首页> 外文期刊>Tribology International >Chemical vapour deposition of diamond films onto tungsten carbide dental burs
【24h】

Chemical vapour deposition of diamond films onto tungsten carbide dental burs

机译:将金刚石薄膜化学气相沉积到碳化钨牙钻上

获取原文
获取原文并翻译 | 示例
           

摘要

Considerable literature is now available on the deposition of CVD diamond onto flat substrates the most common being silicon. However, very little work has been reported on the deposition of diamond onto complex three-dimensional substrates such as dental burs, micro drills and biomedical implants. Diamond is hard, wear resistant, biocompatible and corrosion resistant and therefore is an attractive candidate for uses in dental tools and for medical devices. This study focuses on the deposition of diamond, using a hot filament CVD system, on cobalt-cemented tungsten carbide (WC-Co) rotary cutting dental burs. Conventional dental burs are generally made of sintered polycrystalline diamond (PCD). These have a number of problems associated with heterogeneity of the crystallite, decreased cutting efficiency and a short life. A preferential (111) faceted diamond has been obtained after 12 h deposition at a growth rate of 1.2 μm/h. Diamond coated WC-Co dental burs and conventional sintered burs are used in turning, milling and drilling operations for machining materials made from metal alloys and borosilicate glass. After machining with excessive cutting performance, calculations can be made on flank and crater wear areas. Diamond coated WC-Co dental bur offer significantly lower erosion and higher wear resistance compared to uncoated WC-Co tools and sintered burs.
机译:现在有大量关于将CVD金刚石沉积到平面基板上的文献,其中最常见的是硅。但是,关于将金刚石沉积到复杂的三维基体(例如牙钻,微型钻和生物医学植入物)上的工作报道很少。金刚石是坚硬,耐磨,生物相容和耐腐蚀的,因此是用于牙科工具和医疗设备的有吸引力的候选材料。这项研究的重点是使用热丝CVD系统在钴胶结碳化钨(WC-Co)旋转切削牙钻上沉积钻石。传统的牙钻通常由烧结的多晶金刚石(PCD)制成。这些具有与微晶的异质性,降低的切割效率和短寿命相关的许多问题。沉积12小时后,以1.2μm/ h的生长速度获得了优先(111)刻面金刚石。金刚石涂层的WC-Co牙钻和传统的烧结钻在车削,铣削和钻孔操作中用于加工由金属合金和硼硅酸盐玻璃制成的材料。在以过分的切削性能进行机加工后,可以对侧面和月牙洼磨损区域进行计算。与未涂层的WC-Co工具和烧结钻相比,金刚石涂层的WC-Co牙钻具有明显更低的侵蚀和更高的耐磨性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号